Overview
- Editors:
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Tibor Grasser
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Institut für Mikroelektronik, Technische Universität Wien, Vienna, Austria
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Siegfried Selberherr
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Institut für Mikroelektronik, Technische Universität Wien, Vienna, Austria
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Table of contents (109 papers)
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- Kyu-Baik Chang, Won-Young Chung, Sung-Jin Kim, Young-Min Ko, Jong-Joo Jang, Tai-Kyung Kim et al.
Pages 413-416
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- O. Ertl, C. Heitzinger, S. Selberherr
Pages 417-420
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- C. Populaire, D. Villanueva, S. Orain, H. Brillet-Rouxel
Pages 421-424
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- T. Ichikawa, T. Takase, N. Tamaoki
Pages 425-428
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- Kenji Hirose, Nobuhiko Kobayashi, Hiroyuki Ishii
Pages 429-432
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- Johann Cervenka, Hajdin Ceric, Otmar Ertl, Siegfried Selberherr
Pages 433-436
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- Pierre-Yves Prodhomme, Philippe Blaise, Fabien Fontaine-Vive, Jacky Even, Marius Orlowski
Pages 437-440
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- Young-Kyu Kim, Soon-Yeol Park, Taeyoung Won
Pages 441-444
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- Hong-Hyun Park, Sung-Min Hong, Seonghoon Jin, Hong Shick Min, Young June Park
Pages 445-448
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Back Matter
Pages 453-458
About this book
The "Twelfth International Conference on Simulation of Semiconductor Processes and Devices" (SISPAD 2007) continues a long series of conferences and is held in September 2007 at the TU Wien, Vienna, Austria. The conference is the leading forum for Technology Computer-Aided Design (TCAD) held alternatingly in the United States, Japan, and Europe. The first SISPAD conference took place in Tokyo in 1996 as the successor to three preceding conferences NUPAD, VPAD, and SISDEP. With its longstanding history SISPAD provides a world-wide forum for the presenta tion and discussion of outstanding recent advances and developments in the field of numerical process and device simulation. Driven by the ongoing miniaturization in semiconductor fabrication technology, the variety of topics discussed at this meeting reflects the ever-growing complexity of the subject. Apart from the classic topics like process, device, and interconnect simulation, mesh generation, a broad spec trum of numerical issues, and compact modeling, new simulation approaches like atomistic and first-principles methods have emerged as important fields of research and are currently making their way into standard TCAD suites.