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Ion Implantation: Equipment and Techniques

Proceedings of the Fourth International Conference Berchtesgaden, Fed. Rep. of Germany, September 13–17, 1982

  • Conference proceedings
  • © 1983

Overview

Editors:
  1. Heiner Ryssel

    1. Fraunhofer-Institut für Festkörpertechnologie, München 60, Germany

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  2. Hans Glawischnig

    1. Siemens AG, München 80, Germany

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    You can also search for this editor in PubMed   Google Scholar

Part of the book series: Springer Series in Electronics and Photonics (SSEP, volume 11)

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Table of contents (63 papers)

  1. Front Matter

    Pages I-X
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  2. Ion Implanters

    1. Front Matter

      Pages 1-1
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    2. Physical Limitations of Ion Implantation Equipment

      • P. R. Hanley
      Pages 2-24

    3. A New Ion Implanter for Solar Cell Fabrication

      • K. Tokiguchi, H. Itoh, N. Sakudo, H. Koike, T. Warabisako, T. Saitoh et al.
      Pages 25-30

    4. SURIM — A Westinghouse Surface Implantation Machine

      • M. D. Nahemow, R. E. Fromson, R. Kossowsky, J. L. Pack
      Pages 31-36

    5. A New Research Implanter at the University of Surrey

      • P. L. F. Hemment, J. E. Mynard, E. Pásztor, C. J. Richmond, K. G. Stephens
      Pages 37-44

    6. Radio Frequency Ion Accelerator

      • N. J. Barrett
      Pages 45-53

  3. Ion Sources

    1. Front Matter

      Pages 55-55
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    2. Performance of the Bethge-Baumann Ion Source with Radio Frequency Operation

      • H. F. le Roux, A. G. K. Lutsch
      Pages 56-58

    3. Emittance Measurements on an Indirectly Heated Heavy-Ion Source

      • E. Pásztor, L. Királyhidi
      Pages 59-62

    4. A High-Brightness Duoplasmatron Ion Source

      • R. Keller
      Pages 63-68

    5. Optimization of a Single-Aperture Extraction System for High-Current Ion Sources

      • R. Keller, P. Spädtke, K. Hofmann
      Pages 69-78

    6. Development of a High-Current Ion Source for Non-Volatile Elements

      • R. Keller, F. Nöhmayer, P. Spädtke
      Pages 79-85

    7. The Use of Computers for Designing and Testing Ion Beam Systems

      • W. B. Thompson, I. Honjo, N. Turner
      Pages 86-96

    8. Multipole Ion Source for Ion Implantation and Isotope Separation

      • J. H. Keller
      Pages 97-105

    9. An Ion Source for Semiconductor Implantation

      • A. Latuszyński, D. Maczka, Yu. V. Yushkievich
      Pages 106-112

  4. Implanter Subsystems

    1. Front Matter

      Pages 113-113
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    2. High Throughput Wafer Handling System for Serial Process Ion Implantation

      • S. Dinaro, R. Hertel, N. Turner
      Pages 114-125

    3. Comparison of Beam Scanning Systems

      • N. Turner
      Pages 126-142

    4. A Low-Internal-Resistance and High-Precision High-Voltage Power Supply

      • J. Wu, H. Ma, B. Ren
      Pages 143-148
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Keywords

Editors and Affiliations

  • Fraunhofer-Institut für Festkörpertechnologie, München 60, Germany

    Heiner Ryssel

  • Siemens AG, München 80, Germany

    Hans Glawischnig

Bibliographic Information

  • Book Title: Ion Implantation: Equipment and Techniques

  • Book Subtitle: Proceedings of the Fourth International Conference Berchtesgaden, Fed. Rep. of Germany, September 13–17, 1982

  • Editors: Heiner Ryssel, Hans Glawischnig

  • Series Title: Springer Series in Electronics and Photonics

  • DOI: https://doi.org/10.1007/978-3-642-69156-0

  • Publisher: Springer Berlin, Heidelberg

  • eBook Packages: Springer Book Archive

  • Copyright Information: Springer-Verlag Berlin Heidelberg 1983

  • Softcover ISBN: 978-3-642-69158-4Published: 07 December 2011

  • eBook ISBN: 978-3-642-69156-0Published: 06 December 2012

  • Series ISSN: 0172-5734

  • Edition Number: 1

  • Number of Pages: X, 558

  • Topics: Crystallography and Scattering Methods, Optics, Lasers, Photonics, Optical Devices

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