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Ultimate Limits of Fabrication and Measurement

  • Book
  • © 1995

Overview

Editors:
  1. M. E. Welland

    1. Department of Engineering, The University of Cambridge, Cambridge, UK

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  2. J. K. Gimzewski

    1. IBM Research Division, Zurich Research Laboratory, Rüschlikon, Switzerland

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    You can also search for this editor in PubMed   Google Scholar

Part of the book series: NATO Science Series E: (NSSE, volume 292)

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Table of contents (35 chapters)

  1. Study of Contact in the Fabrication of Gold Nanostructures by Scanning Tunneling Microscopy

    1. Study of Contact in the Fabrication of Gold Nanostructures by Scanning Tunneling Microscopy

      • A. M. Baró, J. Gómez-Herrero, J. I. Pascual, J. Méndez, N. García
      Pages 155-162

  2. Fabrication of Nanoscale Gold Contacts with the STM: Possible Applications

    1. Fabrication of Nanoscale Gold Contacts with the STM: Possible Applications

      • C. Van Haesendonck, L. Stockman, G. Neuttiens, Y. Bruynseraede
      Pages 163-170

  3. Suppression of electron tunneling through liquid crystal molecules due to infrared irradiation

    1. Suppression of electron tunneling through liquid crystal molecules due to infrared irradiation

      • H. Nejoh, V. A. Tkachenko, M. Tsukada, M. Aono
      Pages 171-179

  4. Influence of Thickness Fluctuations on Exchange Coupling in Fe/Cr/Fe Structures

    1. Influence of Thickness Fluctuations on Exchange Coupling in Fe/Cr/Fe Structures

      • Joseph A. Stroscio, D. T. Pierce, J. Unguris, R. J. Celotta
      Pages 181-188

  5. 1→3 Dimensional Structures on a Uni-Directional Substrate

    1. 1→3 Dimensional Structures on a Uni-Directional Substrate

      • P. W. Murray, F. M. Leibsle, C. A. Muryn, H. J. Fisher, C. F. J. Flipse, G. Thornton et al.
      Pages 189-196

  6. S-Layers as Molecular Patterning Structures

    1. S-Layers as Molecular Patterning Structures

      • D. Pum, M. Sara, U. B. Sleytr
      Pages 197-203

  7. Formation of Sub-Micrometer Structures in Soft Functionalized Langmuir—Blodgett Films by Atomic Force Microscopy

    1. Formation of Sub-Micrometer Structures in Soft Functionalized Langmuir—Blodgett Films by Atomic Force Microscopy

      • N. B. Larsen, T. Bjørnholm, J. Garnaes, J. Larsen, K. Schaumburg
      Pages 205-212

  8. Individual Molecules on GaAs(001)-(2×4) and Si(001)-(2×1): Images, Statistics, and Modelling

    1. Individual Molecules on GaAs(001)-(2×4) and Si(001)-(2×1): Images, Statistics, and Modelling

      • C. M. Goringe, A. R. Avery, A. J. Mayne, M. O. Schweitzer, W. Widdra, A. J. Fisher et al.
      Pages 213-220

  9. Extended Abstracts of Invited Papers

    1. Molecular Manufacturing

      • K. E. Drexler
      Pages 221-224

    2. Self-Assembly: Whither and Thither Molecular Machines

      • Jon A. Preece, J. Fraser Stoddart
      Pages 225-228

    3. Nanostructured Sensors for Molecular Recognition

      • W. Göpel
      Pages 229-229

    4. Micromechanisms

      • H. Guckel
      Pages 231-234

    5. Limits to Mechanical Positioning and Displacement Measurements

      • E. Clayton Teague
      Pages 235-236

    6. Is Quantum Mechanics Useful?

      • Rolf Landauer
      Pages 237-240

    7. The Limit of Resistance

      • J. Mannhart
      Pages 241-243

    8. Nanocrystals and Nano-Optics

      • L. E. Brus, J. K. Trautman
      Pages 245-248

  10. Back Matter

    Pages 249-254
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Keywords

About this book

An extensive body of research is involved in pushing miniaturisation to its physical limit, encompassing the miniaturisation of electronic devices, the manipulation of single atoms by scanning tunnelling microscopy, bio-engineering, the chemical synthesis of complex molecules, microsensor technology, and information storage and retrieval. In parallel to these practical aspects of miniaturisation there is also the necessity to understand the physics of small structures.
Ultimate Limits of Fabrication and Measurement brings together a number of leading articles from a variety of fields with the common aim of ultimate miniaturisation and measurement.

Editors and Affiliations

  • Department of Engineering, The University of Cambridge, Cambridge, UK

    M. E. Welland

  • IBM Research Division, Zurich Research Laboratory, Rüschlikon, Switzerland

    J. K. Gimzewski

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