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Secondary Ion Mass Spectrometry SIMS V

Proceedings of the Fifth International Conference, Washington, DC, September 30 – October 4, 1985

  • Conference proceedings
  • © 1986

Overview

Editors:
  1. Alfred Benninghoven

    1. Physikalisches Institut, Universität Münster, Münster, Fed. Rep. of Germany

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  2. Richard J. Colton

    1. Chemistry Division, Naval Research Laboratory, USA

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  3. David S. Simons

    1. Center for Analytical Chemistry, National Bureau of Standards, Gaithersburg, USA

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  4. Helmut W. Werner

    1. Philips Research Laboratories, NL-Eindhoven, The Netherlands

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Part of the book series: Springer Series in Chemical Physics (CHEMICAL, volume 44)

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Table of contents (149 papers)

  1. Combined Techniques and Surface Studies

    1. The Use of SSIMS and ISS to Examine Pt/TiO2 Surfaces

      • G. B. Hoflund, D. A. Asbury, Shin-Puu Jeng, P. H. Holloway
      Pages 206-209

    2. Secondary Ion and Auger Electron Emission by Ar+ Ion Bombardment on Al-Fe Alloys

      • Y. Fukuda
      Pages 210-212

    3. Characterization of Planar Model Co-Mo/γ-Al2O3 Catalysts by SIMS, ESCA, and AES

      • T. Sahin, T. D. Kirkpatrick
      Pages 213-215

    4. Search for SiO2 in Commercial SiC

      • A. Adnot, M. Baril, A. Dufresne
      Pages 216-218

    5. SIMS/XPS Studies of Surface Reactions on Rh(111) and Rh(331)

      • E. White, L. A. DeLouise, N. Winograd
      Pages 219-221

    6. SSIMS — A Powerful Tool for the Characterisation of the Adsorbate State of CO on Metallic and Bimetallic Surfaces

      • A. Brown, J. C. Vickerman
      Pages 222-224

    7. Energy and Angle-Resolved SIMS Studies of Cl2 Adsorption on Ag{110}; Evidence for Coverage Dependent Electronic Structure Rearrangements

      • D. W. Moon, R. J. Bleiler, C. C. Chang, N. Winograd
      Pages 225-227

    8. Molecular Secondary Ion Emission from Different Amino Acid Adsorption States on Metals

      • D. Holtkamp, M. Kempken, P. Klüsener, A. Benninghoven
      Pages 228-230

  2. Ion Microscopy and Image Analysis

    1. Front Matter

      Pages 231-231
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    2. A High-Resolution, Single Ion Sensitivity Video System for Secondary Ion Microscopy

      • D. P. Leta
      Pages 232-234

    3. Dynamic Range Consideration for Digital Secondary Ion Image Depth Profiling

      • S. R. Bryan, R. W. Linton, D. P. Griffis
      Pages 235-238

    4. Digital Slit Imaging for High-Resolution SIMS Depth Profiling

      • S. R. Bryan, D. P. Griffis, R. W. Linton, W. J. Hamilton
      Pages 239-241

    5. Lateral Elemental Distributions on a Corroded Aluminum Alloy Surface

      • R. L. Crouch, D. H. Wayne, R. H. Fleming
      Pages 242-244

    6. Improved Spatial Resolution of the CAMECA IMS-3f Ion Microscope

      • M. T. Bernius, Yong-Chien Ling, G. H. Morrison
      Pages 245-248

    7. Video Tape System for Ion Imaging

      • M. G. Moran, J. T. Brenna, G. H. Morrison
      Pages 249-252

    8. Application of a Framestore Datasystem in Imaging SIMS

      • A. R. Bayly, D. J. Fathers, P. Vohralik, J. M. Walls, A. R. Waugh, J. Wolstenholme
      Pages 253-256

    9. Chemical Characterisation of Insulating Materials Using High Spatial Resolution SSIMS — An Analysis of the Problems and Possible Solutions

      • A. Brown, A. J. Eccles, J. A. van den Berg, J. C. Vickerman
      Pages 257-260

    10. Application of Digital SIMS Imaging to Light Element and Trace Element Mapping

      • D. Newbury, D. Bright, D. Williams, C. M. Sung, T. Page, J. Ness
      Pages 261-263

    11. SIMS Imaging of Silicon Defects

      • R. S. Hockett, D. A. Reed, D. H. Wayne
      Pages 264-267

  3. Depth Profiling and Semiconductor Applications

    1. Front Matter

      Pages 269-269
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Keywords

Editors and Affiliations

  • Physikalisches Institut, Universität Münster, Münster, Fed. Rep. of Germany

    Alfred Benninghoven

  • Chemistry Division, Naval Research Laboratory, USA

    Richard J. Colton

  • Center for Analytical Chemistry, National Bureau of Standards, Gaithersburg, USA

    David S. Simons

  • Philips Research Laboratories, NL-Eindhoven, The Netherlands

    Helmut W. Werner

Bibliographic Information

  • Book Title: Secondary Ion Mass Spectrometry SIMS V

  • Book Subtitle: Proceedings of the Fifth International Conference, Washington, DC, September 30 – October 4, 1985

  • Editors: Alfred Benninghoven, Richard J. Colton, David S. Simons, Helmut W. Werner

  • Series Title: Springer Series in Chemical Physics

  • DOI: https://doi.org/10.1007/978-3-642-82724-2

  • Publisher: Springer Berlin, Heidelberg

  • eBook Packages: Springer Book Archive

  • Copyright Information: Springer-Verlag Berlin Heidelberg 1986

  • Softcover ISBN: 978-3-642-82726-6Published: 11 January 2012

  • eBook ISBN: 978-3-642-82724-2Published: 06 December 2012

  • Series ISSN: 0172-6218

  • Series E-ISSN: 2364-9003

  • Edition Number: 1

  • Number of Pages: XXII, 564

  • Topics: Mass Spectrometry, Solid State Physics, Spectroscopy and Microscopy, Physical Chemistry

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