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  • Book
  • © 2010

Technology of Gallium Nitride Crystal Growth

  • Summarizes the current state of the art of GaN growth technology
  • Integrates materials science and physical aspects
  • A reference work for researchers and engineers alike
  • May serve as a study text for graduate students in materials sciences
  • Includes supplementary material: sn.pub/extras

Part of the book series: Springer Series in Materials Science (SSMATERIALS, volume 133)

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Table of contents (14 chapters)

  1. Front Matter

    Pages i-xxi
  2. Market for Bulk GaN Crystals

    1. Front Matter

      Pages 1-1
    2. Development of the Bulk GaN Substrate Market

      • Andrew D. Hanser, Keith R. Evans
      Pages 3-27
  3. Vapor Phase Growth Technology

    1. Front Matter

      Pages 30-30
    2. Hydride Vapor Phase Epitaxy of GaN

      • Akinori Koukitu, Yoshinao Kumagai
      Pages 31-60
    3. Growth of Bulk GaN Crystals by HVPE on Single Crystalline GaN Seeds

      • B. Łucznik, B. Pastuszka, G. Kamler, I. Grzegory, S. Porowski
      Pages 61-78
    4. Freestanding GaN Wafers by Hydride Vapor Phase Epitaxy Using Void-Assisted Separation Technology

      • Y. Oshima, T. Yoshida, T. Eri, K. Watanabe, M. Shibata, T. Mishima
      Pages 79-96
    5. Nonpolar and Semipolar GaN Growth by HVPE

      • Paul T. Fini, Benjamin A. Haskell
      Pages 97-117
    6. High Growth Rate MOVPE

      • K. Matsumoto, H. Tokunaga, A. Ubukata, K. Ikenaga, Y. Fukuda, Y. Yano et al.
      Pages 119-133
  4. Solution Growth Technology

    1. Front Matter

      Pages 136-136
    2. Ammonothermal Growth of GaN Under Ammono-Basic Conditions

      • R. Doradziński, R. Dwiliński, J. Garczyński, L. P. Sierzputowski, Y. Kanbara
      Pages 137-160
    3. A Pathway Toward Bulk Growth of GaN by the Ammonothermal Method

      • Tadao Hashimoto, Shuji Nakamura
      Pages 161-182
    4. Acidic Ammonothermal Growth Technology for GaN

      • Dirk Ehrentraut, Yuji Kagamitani
      Pages 183-203
  5. Flux Growth Technology

    1. Front Matter

      Pages 207-207
    2. High Pressure Solution Growth of Gallium Nitride

      • Michal Boćkowski, Pawel Strąk, Izabella Grzegory, Sylwester Porowski
      Pages 207-234
    3. Low Pressure Solution Growth of Gallium Nitride

      • E. Meissner, S. Hussy, J. Friedrich
      Pages 245-273
  6. Characterization of GaN Crystals

    1. Front Matter

      Pages 277-277
    2. Optical Properties of GaN Substrates

      • Shigefusa F. Chichibu
      Pages 277-293

About this book

This book deals with the important technological aspects of the growth of GaN single crystals by HVPE, MOCVD, ammonothermal and flux methods for the purpose of free-standing GaN wafer production. Leading experts from industry and academia report in a very comprehensive way on the current state-of-the-art of the growth technologies and optical and structural properties of the GaN crystals are compared.

Editors and Affiliations

  • Inst. Materials Research (IMR), Tohoku University, Sendai, Japan

    Dirk Ehrentraut

  • Integrierte Systeme und, Bauelementetechnologie (IISB), Fraunhofer Institut für, Erlangen, Germany

    Elke Meissner

  • Inst. High-Pressure Physics, PAN Warszawa, Warszawa, Poland

    Michal Bockowski

About the editors

Dr. Dirk Ehrentraut received a Diploma in Crystallography from the Humboldt University of Berlin, Germany and a Ph.D. in Sciences from the Institute of Applied Optics at the Swiss Federal Institute of Technology in Lausanne (EPFL), Switzerland. He joined the Tohoku University end of 2003 and is currently a visiting professor of the Institute of Multidisciplinary Research of Advanced Materials. His field of competence covers the crystal growth of films and bulk material from the liquid and vapor phase and material aspects of the wide band gap semiconductors of group-III nitrides and ZnO. He has authored 130 publications in books, journals and conferences and holds 6 patents.

Dr. Elke Meissner graduated from the University of Erlangen, Germany in the field of applied mineralogy. Later she received a PhD from the University of Bayreuth, Germany. She is a senior scientist in the Department of Crystal Growth at the Fraunhofer Institute of Integrated Systems and Device Technology (IISB) in Erlangen and became head of the working group Defect Engineering in 2007. She has a broad background in process properties correlation for advanced materials in various fields like silicon nitride ceramics and applied & experimental mineralogy. Her recent work is strongly focussed on the structural characterization of crystals and crystal layers of novel semiconductors. Dr. Meissner is inventor or co-inventor of 3 international patents and authored more than 50 papers or contributions to journals and conference.

Dr. Michal Bockowski received the M.Sc. Eng. in Solid State Physics from the Warsaw University of Technology, Poland and the Ph.D. in the Chemistry of Solids 1995 from the University Montpellier II, France. He is currently a Research Associate of the Institute of High Pressure Physics of the Polish Academy of Sciences and a technologist at TopGaN Ltd., Poland. He has authored >120 publications in journals and conferences and holds 2 international patents.

Bibliographic Information

Buy it now

Buying options

eBook USD 169.00
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book USD 219.99
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info
Hardcover Book USD 219.99
Price excludes VAT (USA)
  • Durable hardcover edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Other ways to access