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  • Book
  • © 2009

Nanoscale Devices

Fabrication, Functionalization, and Accessibility from the Macroscopic World

  • Deals with the miniaturization of electronic devices towards the nanoscale
  • Presents the concept of nanolithography and nanodevices
  • A reference work for researchers and engineers alike
  • Includes supplementary material: sn.pub/extras

Part of the book series: NanoScience and Technology (NANO)

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Table of contents (13 chapters)

  1. Front Matter

    Pages 1-14
  2. Basics

    1. Front Matter

      Pages 1-1
    2. Matter on the Nanoscale

      • Gianfranco Cerofolini
      Pages 3-7
    3. Top-Down Paradigm to Miniaturization

      • Gianfranco Cerofolini
      Pages 9-18
    4. Physical Limits to Miniaturization

      • Gianfranco Cerofolini
      Pages 19-44
    5. The Crossbar Structure

      • Gianfranco Cerofolini
      Pages 45-52
    6. Crossbar Production

      • Gianfranco Cerofolini
      Pages 53-68
    7. The Litho-to-Nano link

      • Gianfranco Cerofolini
      Pages 69-82
    8. Functional Molecules

      • Gianfranco Cerofolini
      Pages 83-93
    9. Grafting Functional Molecules

      • Gianfranco Cerofolini
      Pages 95-130
  3. Advanced Topics: Self-Similar Structures, Molecular Motors, and Nanobiosystems

    1. Front Matter

      Pages 134-134
  4. Advanced Topics:Self-similar structures, molecular motors, nanobiosystems

    1. Examples

      • Gianfranco Cerofolini
      Pages 135-140
    2. Self-Similar Nanostructures

      • Gianfranco Cerofolini
      Pages 141-149
    3. Molecular Motors

      • Gianfranco Cerofolini
      Pages 151-163
    4. Nanobiosensing

      • Gianfranco Cerofolini
      Pages 165-178
    5. Abstract Technology

      • Gianfranco Cerofolini
      Pages 179-190
  5. Back Matter

    Pages 197-211

About this book

The second half of the twentieth century and the beginning of the twenty ?rst have been characterized by the most impressive industrial revolution ever seen. In - proximately 40years, the complexity of integrated circuits (ICs) has increased by a 9 factor of 10 , with a corresponding reduction of the cost per bit by eight orders of magnitude. Not only has this evolution allowed dramatic progress in allscienti?c ?elds (large computers, space probes, etc.), but also has fueled the economic development with the raise of new markets (personal computers, cellular phones, etc.) and even social revolutions (world wide web, global village, etc.). In last years, however, the situation has signi?cantly changed: the continuous scaling down of device size has eventually brought the IC major technique, p- tolithography, to its limits. Overcoming its original limits has been proved to be possible, but the price to pay for that has changed the playing rules – while at the beginning of the IC history the evolution was driven by technology, now it is driven by economy, the cost of a medium size production plant being in the range of a few billion dollars.

Authors and Affiliations

  • Dipto. Scienza dei Materiali, Università di Milano-Bicocca, Milano, Italy

    Gianfranco Cerofolini

About the author

Gianfranco ("GF") Cerofolini (degree in Physics from the University of Milan, 1970) is visiting researcher at the University of Milano-Bicocca. His major interests are addressed to the physical limits of miniaturization and to the 'emergence' of higher-level phenomena from the underlying lower-level substrate (measurement in quantum mechanics, life in biological systems, etc.).

Although his research activity has been carried out in the industry (vacuum: SAES Getters; telecommunication: Telettra; chemistry and energetics: ENI; integrated circuits: STMicroelectronics), he has had frequent collaborations with academic centers (University of Lublin, IMEC, Stanford University, City College of New York, several Italian Universities), has been lecturer in a few Universities (Pisa, Modena, and Polytechnic of Milan), and currently is lecturer at the University of Milano-Bicocca.

His research has covered several areas: adsorption, biophysics, CMOS processing (oxidation, diffusion, ion implantation, gettering), electronic and optical materials, theory of acidity, and nanoelectronics.

A gettering technique of widespread use in microelectronics, the complete setting of ST's first silicon-gate CMOS process, the development of a process for low-fluence SOI, and the identification of a strategy for molecular electronics via a conservative extension of the existing microelectronic technology, are among his major industrial achievements. His main scientific results range from the preparation and characterization of ideal silicon p-n junctions and the discovery of a mechanism therein of pure generation without recombination, to the theoretical description of layer-by-layer oxidation at room temperature of silicon, and to the development of original mathematical techniques for the description of adsorption on heterogeneous or soft surfaces.

The results of his activity have been published in approximately 300 articles, chapters to books, and encyclopaedic items, and in a score of patents.

Bibliographic Information

Buy it now

Buying options

eBook USD 84.99
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book USD 109.99
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info
Hardcover Book USD 109.99
Price excludes VAT (USA)
  • Durable hardcover edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Other ways to access