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Nanoscale Spectroscopy and Its Applications to Semiconductor Research

  • Conference proceedings
  • © 2002

Overview

Editors:
  1. Yoshio Watanabe

    1. NTT Basic Research Laboratories, Atsugi-shi Kanagawa, Japan

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  2. Giancarlo Salviati

    1. Istituto MASPEC, Parma, Italy

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  3. Stefan Heun

    1. Sincrotrone Trieste, Trieste, Italy

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  4. Naoki Yamamoto

    1. Tokyo Institute of Technology, Tokyo, Japan

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Part of the book series: Lecture Notes in Physics (LNP, volume 588)

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Table of contents (27 papers)

  1. Front Matter

    Pages I-XI
    Download chapter PDF

  2. Introduction

    • S. Heun, G. Salviati, Y. Watanabe, N. Yamamoto
    Pages 1-7

  3. Spectro-microscopy by TEM-SEM

    • K. Yagi, Y. Tanishiro, H. Minoda
    Pages 11-23

  4. Determination of Nanosize Particle Distribution by Low Frequency Raman Scattering: Comparison to Electron Microscopy

    • M. Ivanda, A. M. Tonejc, I. Djerdj, M. Gotić, S. Musić, G. Mariotto et al.
    Pages 24-36

  5. Development of Cathodoluminescence (CL) for Semiconductor Research, Part I: TEM-CL Study of Microstructures and Defects in Semiconductor Epilayers

    • N. Yamamoto
    Pages 37-51

  6. Development of CL for Semiconductor Research, Part II: Cathodoluminescence Study of Semiconductor Nanoparticles and Nanostructures Using Low-Electron-Beam Energies

    • T. Sekiguchi
    Pages 52-60

  7. Development of CL for Semiconductor Research, Part III: Study of Degradation Mechanisms in Compound Semiconductor-Based Devices by SEM-CL

    • G. Salviati
    Pages 61-73

  8. Microcharacterization of Conformal GaAs on Si Layers by Spatially Resolved Optical Techniques

    • O. Martínez, M. Avella, A. M. Ardila, J. Jiménez, B. Gerad, E. G. Lafon
    Pages 74-81

  9. Strain Analysis in Submicron Electron Devices by Convergent Beam Electron Diffraction

    • A. Armigliato, R. Balboni, S. Frabboni, A. Benedetti, A. G. Cullis
    Pages 82-90

  10. Synchrotron Radiation X-ray Microscopy Based on Zone Plate Optics

    • B. Kaulich, M. Kiskinova
    Pages 93-110

  11. Long-Term Oxidation Behaviour of Lead Sulfide Surfaces

    • K. C. Prince, S. Heun, L. Gregoratti, A. Barinov, M. Kiskinova
    Pages 111-120

  12. Cross-Sectional Photoemission Spectromicroscopy of Semiconductor Heterostructures

    • F. Barbo, M. Bertolo, A. Bianco, G. Cautero, R. Cimino, S. Fontana et al.
    Pages 121-130

  13. Surface Imaging Using Electrons Excited by Metastable-Atom Impacts

    • N. Ueno, H. Yasufuku, S. Kera, K. K. Okudaira, Y. Harada
    Pages 131-144

  14. Application of Photoemission Electron Microscopy to Magnetic Domain Imaging

    • T. Kinoshita
    Pages 145-156

  15. Photoelectron Spectroscopy with a Photoemission Electron Microscope

    • S. Heun, Y. Watanabe
    Pages 157-171

  16. X-ray Photoemission and Low-Energy Electron Microscope

    • R. VaÅ¡ina, M. Mynář, V. Kolařík
    Pages 172-179

  17. Application of Imaging-Type Photoelectron Spectromicroscopy to Solid-State Physics

    • T. Kinoshita, Y. Haruyama
    Pages 180-195

  18. Scanning Near-Field Optical Spectroscopy of Quantum-Confined Semiconductor Nanostructures

    • M. Colocci, V. Emiliani, P. G. Gucciardi, J. Kudrna, A. Vinattieri
    Pages 199-209

  19. Novel Tuning Fork Sensor for Low-Temperature Near-Field Spectroscopy

    • A. Crottini, J. L. Staehli, B. Deveaud, X. L. Wang, M. Ogura
    Pages 210-221

  20. Manipulating, Reacting, and Constructing Single Molecules with a Scanning Tunneling Microscope Tip

    • S. -W. Hla
    Pages 222-230
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Keywords

About this book

Fabrication technologies for nanostructured devices have been developed recently, and the electrical and optical properties of such nanostructures are a subject of advanced research.
This book describes the different approaches to spectroscopic microscopy, i.e., Electron Beam Probe Spectroscopy, Spectroscopic Photoelectron Microscopy, and Scanning Probe Spectroscopy. It will be useful as a compact source of reference for the experienced reseracher, taking into account at the same time the needs of postgraduate students and nonspecialist researchers by using a tutorial approach throughout.

Reviews

"This is an unusual collection and the vast audience of workers on semiconductor structure will want to have access to it." (Ultramicroscopy, 99, 2004)

Editors and Affiliations

  • NTT Basic Research Laboratories, Atsugi-shi Kanagawa, Japan

    Yoshio Watanabe

  • Istituto MASPEC, Parma, Italy

    Giancarlo Salviati

  • Sincrotrone Trieste, Trieste, Italy

    Stefan Heun

  • Tokyo Institute of Technology, Tokyo, Japan

    Naoki Yamamoto

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