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Hard X-ray Photoelectron Spectroscopy (HAXPES)

  • Book
  • © 2016

Overview

Editors:
  1. Joseph Woicik

    1. Brookhaven National Laboratory, National Institute of Standards and Technology, Upton, USA

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  • Provides a complete survey of hard X-ray photoelectron spectroscopy
  • Covers instrumentation, technique, theory and applications
  • Written by leading experts
  • Reaches from physics to chemistry, material science and engineering
  • Includes supplementary material: sn.pub/extras

Part of the book series: Springer Series in Surface Sciences (SSSUR, volume 59)

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Table of contents (20 chapters)

  1. Front Matter

    Pages i-xii
    Download chapter PDF

  2. Hard X-ray Photoemission: An Overview and Future Perspective

    • Charles S. Fadley
    Pages 1-34

  3. The First Development of Photoelectron Spectroscopy and Its Relation to HAXPES

    • Svante Svensson, Evelyn Sokolowski, Nils Mårtensson
    Pages 35-42

  4. HAXPES at the Dawn of the Synchrotron Radiation Age

    • Piero Pianetta, Ingolf Lindau
    Pages 43-63

  5. Hard-X-ray Photoelectron Spectroscopy of Atoms and Molecules

    • Marc Simon, Maria Novella Piancastelli, Dennis W. Lindle
    Pages 65-110

  6. Inelastic Mean Free Paths, Mean Escape Depths, Information Depths, and Effective Attenuation Lengths for Hard X-ray Photoelectron Spectroscopy

    • C. J. Powell, S. Tanuma
    Pages 111-140

  7. Hard X-ray Angle-Resolved Photoelectron Spectroscopy (HARPES)

    • Alexander X. Gray
    Pages 141-157

  8. One Step Model Description of HARPES: Inclusion of Disorder and Temperature Effects

    • Jürgen Braun, Ján Minár, Hubert Ebert
    Pages 159-174

  9. Recoil Effects in X-ray Photoelectron Spectroscopy

    • Yosuke Kayanuma
    Pages 175-195

  10. Depth-Dependence of Electron Screening, Charge Carriers and Correlation: Theory and Experiments

    • Munetaka Taguchi, Giancarlo Panaccione
    Pages 197-216

  11. The Influence of Final-State Effects on XPS Spectra from First-Row Transition-Metals

    • Andrew P. Grosvenor, Mark C. Biesinger, Roger St. C. Smart, Andrea R. Gerson
    Pages 217-262

  12. Optimizing Polarization Dependent Hard X-ray Photoemission Experiments for Solids

    • J. Weinen, T. C. Koethe, S. Agrestini, D. Kasinathan, F. Strigari, T. Haupricht et al.
    Pages 263-275

  13. Photoelectron Emission Excited by a Hard X-ray Standing Wave

    • Jörg Zegenhagen, Tien-Lin Lee, Sebastian Thiess
    Pages 277-307

  14. Depth Profiling and Internal Structure Determination of Low Dimensional Materials Using X-ray Photoelectron Spectroscopy

    • Sumanta Mukherjee, Pralay K. Santra, D. D. Sarma
    Pages 309-339

  15. Probing Perovskite Interfaces and Superlattices with X-ray Photoemission Spectroscopy

    • Scott A. Chambers
    Pages 341-380

  16. HAXPES Measurements of Heterojunction Band Alignment

    • Conan Weiland, Abdul K. Rumaiz, Joseph C. Woicik
    Pages 381-405

  17. HAXPES Studies of Advanced Semiconductors

    • Patrick S. Lysaght, Joseph C. Woicik
    Pages 407-446

  18. Liquid/Solid Interfaces Studied by Ambient Pressure HAXPES

    • Z. Liu, H. Bluhm
    Pages 447-466

  19. HAXPES Applications to Advanced Materials

    • Keisuke Kobayashi
    Pages 467-531

  20. Photoelectron Microscopy and HAXPES

    • Raymond Browning
    Pages 533-554
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About this book

This book provides the first complete and up-to-date summary of the state of the art in HAXPES and motivates readers to harness its powerful capabilities in their own research. The chapters are written by experts. They include historical work, modern instrumentation, theory and applications. This book spans from physics to chemistry and materials science and engineering. In consideration of the rapid development of the technique, several chapters include highlights illustrating future opportunities as well.

Editors and Affiliations

  • Brookhaven National Laboratory, National Institute of Standards and Technology, Upton, USA

    Joseph Woicik

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