Authors:
- Enables readers to tackle the challenge of layout decompositions for different patterning techniques
- Presents a coherent framework, including standard cell compliance and detailed placement, to enable Triple Patterning Lithography (TPL) friendly design
- Includes coverage of the design for manufacturability with E-Beam lithography
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Table of contents (6 chapters)
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Front Matter
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Back Matter
About this book
Authors and Affiliations
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ECE Department, The University of Texas, Austin, USA
Bei Yu, David Z. Pan
Bibliographic Information
Book Title: Design for Manufacturability with Advanced Lithography
Authors: Bei Yu, David Z. Pan
DOI: https://doi.org/10.1007/978-3-319-20385-0
Publisher: Springer Cham
eBook Packages: Engineering, Engineering (R0)
Copyright Information: Springer International Publishing Switzerland 2016
Hardcover ISBN: 978-3-319-20384-3Published: 23 November 2015
Softcover ISBN: 978-3-319-37393-5Published: 23 August 2016
eBook ISBN: 978-3-319-20385-0Published: 28 October 2015
Edition Number: 1
Number of Pages: XI, 164
Topics: Circuits and Systems, Processor Architectures, Electronics and Microelectronics, Instrumentation