Design for Manufacturability with Advanced Lithography

Authors: Yu, Bei, Pan, David Z

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  • Enables readers to tackle the challenge of layout decompositions for different patterning techniques
  • Presents a coherent framework, including standard cell compliance and detailed placement, to enable Triple Patterning Lithography (TPL) friendly design
  • Includes coverage of the design for manufacturability with E-Beam lithography
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eBook $74.99
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  • ISBN 978-3-319-20385-0
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Hardcover $99.00
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Softcover $99.00
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About this book

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.

Table of contents (6 chapters)

Table of contents (6 chapters)

Buy this book

eBook $74.99
price for USA in USD
  • ISBN 978-3-319-20385-0
  • Digitally watermarked, DRM-free
  • Included format: PDF, EPUB
  • Immediate eBook download after purchase and usable on all devices
  • Bulk discounts available
Hardcover $99.00
price for USA in USD
Softcover $99.00
price for USA in USD
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Bibliographic Information

Bibliographic Information
Book Title
Design for Manufacturability with Advanced Lithography
Authors
Copyright
2016
Publisher
Springer International Publishing
Copyright Holder
Springer International Publishing Switzerland
eBook ISBN
978-3-319-20385-0
DOI
10.1007/978-3-319-20385-0
Hardcover ISBN
978-3-319-20384-3
Softcover ISBN
978-3-319-37393-5
Edition Number
1
Number of Pages
XI, 164
Topics