Fundamental Aspects of Plasma Chemical Physics
Kinetics
Authors: Capitelli, M., Celiberto, R., Colonna, G., Esposito, F., Gorse, C., Hassouni, K., Laricchiuta, A., Longo, S.
- Presents and discusses elected examples in different applied fields, such as microelectronics, fusion, and aerospace
- Provides detailed descriptions of the state-to-state kinetic approach for benchmark plasma systems through worked examples
- Approaches the subject completely by assessing both fundamental concepts and problems still open in the research community
- Presents the third volume in a series of three about plasma chemistry with a focus on the electron and heavy particle kinetics in non-equilibrium plasmas emphasizing the coupling between the two kinetics
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- About this book
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Describing non-equilibrium "cold" plasmas through a chemical physics approach, this book uses the state-to-state plasma kinetics, which considers each internal state as a new species with its own cross sections. Extended atomic and molecular master equations are coupled with Boltzmann and Monte Carlo methods to solve the electron energy distribution function. Selected examples in different applied fields, such as microelectronics, fusion, and aerospace, are presented and discussed including the self-consistent kinetics in RF parallel plate reactors, the optimization of negative ion sources and the expansion of high enthalpy flows through nozzles of different geometries.
The book will cover the main aspects of the state-to-state kinetic approach for the description of nonequilibrium cold plasmas, illustrating the more recent achievements in the development of kinetic models including the self-consistent coupling of master equations and Boltzmann equation for electron dynamics. To give a complete portrayal, the book will assess fundamental concepts and theoretical formulations, based on a unified methodological approach, and explore the insight in related scientific problems still opened for the research community.
- About the authors
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Mario Capitelli, University of Bari, mario.capitelli@ba.imip.cnr.it
Gianpiero Colonna, IMIP CNR
Fabrizio Esposito, IMIP CNR
Khaled Hassouni, Institut Galilee-Univeriste Paris
Annarita Laricchiuta, IMIP CNR
Savino Longo, University of Bari
- Reviews
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“The work will be a valuable resource for researchers using many applications involving nonequilibrium cold plasmas such as plasma beams, etching, cleaning, deposition, surface activation, and gas lasers. … Extensive references are provided, chapter-by-chapter, in addition to useful tables of reactions and processes with descriptions and references. … Summing Up: Recommended. Graduate students, researchers/faculty, and professionals/practitioners.” (T. Eastman, Choice, Vol. 53 (10), June, 2016)
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- Download Sample pages 1 PDF (1.4 MB)
- Download Table of contents PDF (81.8 KB)
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Bibliographic Information
- Bibliographic Information
-
- Book Title
- Fundamental Aspects of Plasma Chemical Physics
- Book Subtitle
- Kinetics
- Authors
-
- Mario Capitelli
- Roberto Celiberto
- Gianpiero Colonna
- Fabrizio Esposito
- Claudine Gorse
- Khaled Hassouni
- Annarita Laricchiuta
- Savino Longo
- Series Title
- Springer Series on Atomic, Optical, and Plasma Physics
- Series Volume
- 85
- Copyright
- 2016
- Publisher
- Springer-Verlag New York
- Copyright Holder
- Springer New York
- eBook ISBN
- 978-1-4419-8185-1
- DOI
- 10.1007/978-1-4419-8185-1
- Hardcover ISBN
- 978-1-4419-8184-4
- Softcover ISBN
- 978-1-4939-4163-6
- Series ISSN
- 1615-5653
- Edition Number
- 1
- Number of Pages
- XVI, 318
- Topics
