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Interconnect Noise Optimization in Nanometer Technologies

Authors: Elgamel, Mohamed, Bayoumi, Magdy

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  • ISBN 978-0-387-29366-0
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Hardcover $169.99
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About this book

Interconnect has become the dominating factor in determining system performance in nanometer technologies. Dedicated to this subject, Interconnect Noise Optimization in Nanometer Technologies provides insight and intuition into layout analysis and optimization for interconnect in high speed, high complexity integrated circuits.

The authors bring together a wealth of information presenting a range of CAD algorithms and techniques for synthesizing and optimizing interconnect. Practical aspects of the algorithms and the models are explained with sufficient details. The book investigates the most effective parameters in layout optimization. Different post-layout optimization techniques with complexity analysis and benchmarks tests are provided. The impact crosstalk noise and coupling on the wire delay is analyzed. Parameters that affect signal integrity are also considered.

Table of contents (9 chapters)

Table of contents (9 chapters)
  • Introduction

    Pages 1-3

  • Noise Analysis and Design in Deep Submicron

    Pages 5-28

  • Interconnect Noise Analysis and Optimization Techniques

    Pages 29-43

  • Crosstalk Noise Analysis in Ultra Deep Submicrometer Technologies

    Pages 45-57

  • Minimum Area Shield Insertion for Inductive Noise Reduction

    Pages 59-73

Buy this book

eBook $109.00
price for USA in USD (gross)
  • ISBN 978-0-387-29366-0
  • Digitally watermarked, DRM-free
  • Included format: PDF
  • ebooks can be used on all reading devices
  • Immediate eBook download after purchase
Hardcover $169.99
price for USA in USD
  • ISBN 978-0-387-25870-6
  • Free shipping for individuals worldwide
  • Usually dispatched within 3 to 5 business days.
Softcover $139.99
price for USA in USD
  • ISBN 978-1-4419-3844-2
  • Free shipping for individuals worldwide
  • Usually dispatched within 3 to 5 business days.
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Bibliographic Information

Bibliographic Information
Book Title
Interconnect Noise Optimization in Nanometer Technologies
Authors
Copyright
2006
Publisher
Springer US
Copyright Holder
Springer-Verlag US
eBook ISBN
978-0-387-29366-0
DOI
10.1007/0-387-29366-3
Hardcover ISBN
978-0-387-25870-6
Softcover ISBN
978-1-4419-3844-2
Edition Number
1
Number of Pages
XIX, 137
Topics