Work Function and Band Alignment of Electrode Materials

1. Front Matter

   Pages i-viii

   PDF

2. Introduction: Functions and Performances Governed by the Work Function

   • Michiko Yoshitake

   Pages 1-6

3. What is the Work Function?: Definition and Factors that Determine the Work Function

   • Michiko Yoshitake

   Pages 7-34

4. Modification of the Work Function

   • Michiko Yoshitake

   Pages 35-69

5. Measurement of Work Function

   • Michiko Yoshitake

   Pages 71-95

6. Modification of Band Alignment via Work Function Control

   • Michiko Yoshitake

   Pages 97-112

7. Advanced Models for Practical Devices

   • Michiko Yoshitake

   Pages 113-126

8. Utilization of Interface Potential

   • Michiko Yoshitake

   Pages 127-136

9. Correction to: Work Function and Band Alignment of Electrode Materials

   • Michiko Yoshitake

   Pages C1-C2

This book covers a wide range of topics on work function and band alignment, from the basics to practical examples. Work function and band alignment determine electric properties at the interface including surfaces, such as electron emission, the Schottky barrier height, and ohmic contact. Basic physics is used to systematically explain how to adjust and measure work function and how to modify the band alignment required for controlling work function in functional materials and electrodes. Methods introduced in the book help to improve device performance and to solve the problems of controlling the voltage and efficiency of devices in a great variety of applications, including electronic devices, optical devices such as displays, and energy devices such as solar cells and batteries. Understanding the technical methods necessary for controlling work function and band alignment can help to solve problems such as non-ohmic contact at source–electrode or drain–electrode interfaces in metal–oxide–silicon structures, which directly contributes to improving power saving and reducing heat generation in computers.

• Controlling Work Function for Band Alignment
• Electron Emission Control
• Hole-electron Injection Barrier
• Interface Potential Control
• Metal-Semiconductor Interfaces
• Ohmic Contact Formation
• Schottky Barrier Height Control

• National Institute for Materials Science, Tsukuba, Japan

  Michiko Yoshitake

Dr. Michiko Yoshitake has worked on surfaces and thin films using ultrahigh vacuum instruments for more than 30 years. Her main focus has been the establishment of various prediction methods of either phenomena or material properties rather than the development of materials. She also has long experience in surface analysis, especially in X-ray photoelectron spectroscopy.

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