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MRS Advances - Volume 3 Editorial Board

Volume 3|Principal Editors

Haleh Ardebili, University of Houston, USA

Viktoriia Babicheva, Georgia State University, USA

Alex Belianinov, University of Houston, USA

Juan Beltran - Huarac, Harvard University, USA

Liu Bin, National University of Singapore, Singapore

Nicolas Briot, University of Kentucky, USA

Thierry Brousse, Institut des Matériaux Jean Rouxel, France

Jonathan Cullen, University of Cambridge, UK

Marie-Helene Delville, Institut de Chimie de la Matière Condensée de Bordeaux, France

Chaitanya Deo, Georgia Institute of Technology, USA

Peter M. Derlet, Paul Scherrer Institute, Switzerland

Yizhou Dong, The Ohio State University, USA

Phillip Edmundson, Oak Ridge National Library, USA

Hongyou Fan, Sandia National Laboratories, USA

Franz Faupel, University of Kiel, Germany

Takafumi Fukushima, Tohoku University, Japan

Lan Fu, The Australian National University, Australia

Simerjeet K. Gill, Brookhaven National Laboratory, USA

I. Emre Gunduz, Purdue University, USA

Eva Hemmer, University of Ottawa, Canada

Owen Hildreth, Arizona State University, USA

Jens Hänisch, Karlsruhe Institute of Technology, Germany

Anita Ho-Baillie, University of New South Wales, Australia

Yuhang Hu, University of Illinois at Urbana-Champaign, USA

Marc in het Panhuis, University of Wollongong, Australia

Hannes Jónsson, University of Iceland, Iceland

Smagul Karazhanov, Institute for Energy Technology (IFE), Norway

Kaplana Katti, North Dakota State University, USA

Seyoung Kim, IBM T.J. Watson Research Center, USA

Joseph Kioseoglou, Aristotle University of Thessaloniki, Greece

Robert Klie, University of Illinois at Chicago, USA

Sudhir Kulkarni, Air Liquide, France

Duygu Kuzum, University of California, San Diego, USA

Julie Last, University of Wisconsin-Madison, USA

Doh C. Lee, Korea Advanced Institute of Science and Technology, South Korea

Hyun-Wook Lee, Ulsan National Institute of Science and Technology, South Korea

Chuan Liu, Sun Yat-sen University, China

Robert Maass, University of Illinois at Urbana-Champaign, USA

Himadri Majumdar, VTT Technical Research Center of Finland Ltd., Finland

Amy Marconnet, Purdue University, USA

Benedetto Marelli, Massachusetts Institute of Technology, USA

Carlos Martinez, Purdue University, USA

Jeff McCallum, University of Melbourne, Australia

Matteo Meneghini, University of Padova, Italy

Ivan Minev, Technische Universität Dresden, USA

Amit Misra, University of Michigan-Ann Arbor, USA

Vadym Mochalin, Missouri University of Science and Technology, USA

Michaël Molinari, Universite de Reims Champagne Ardenne, France

Matteo Moretti, I.R.C.C.S Istituto Ortopedico Galeazzi, Italy

SungWoo Nam, University of Illinois at Urbana-Champaign, USA

Tse Nga Ng, University of California, San Diego, USA

Stefan Ochsenbein, ETH Zurich, Switzerland

Volkan Ortalan, Purdue University, USA

Cengiz Ozkan, University of California, Riverside, USA

Ulli Pietsch, University of Siegen, Germany

Elizabeth Podlaha-Murphy, Clarkson University, USA

Vicky Poenitzsch, Southwest Research Institute , USA

Ketul Popat, University of Fukui, Japan

Maria Theresa Pérez Prado, IMDEA Materials Institute, Spain

Stefania Privitera, Institute for Microelectronics and Microsystems (IMM), Italy

Yue Qi, Michigan State University, USA

Venkatesan Renugopalakishnan, Northeastern University, USA

Alberto Saiani, University of Manchester, UK

Evan Scott, Northwestern University, USA

Bartlett Sheinberg, Houston Community College, USA

Yang Shen, Tsinghua University, China

Kenji Shiojima, University of Fukui, Japan

Xun Shi, Shanghai Institute of Ceramics, China

Yi-Yang Sun, Shanghai Institute of Ceramics, Chinese Academy of Sciences, China

Yugang Sun, Temple University, USA

Zaicheng Sun, Beijing University of Technology, China

Laurene Tetard, University of Central Florida, USA

Olivier Thomas, Aix Marseille Université, France

James G. Tobin, University of Wisconsin-Oshkosh, USA

Rita Toth, Swiss Federal Laboratories for Materials Science and Technology (EPMA), Switzerland

Marie-Lise Tremblay, Hydro Quebec, Canada

Noritaka Usami, Nagoya University, Japan

Silvia Vignolini, University of Cambridge, UK

Peng Wang, King Abdullah University of Science and Technology, Saudi Arabia

Yan Wang, Worcester Polytechnic Institute, USA

Xiaoliang Wei, Pacific Northwest National Laboratory, USA

Seunghyup Yoo, Korea Advanced Institute of Science and Technology, South Korea

William Yu, Louisiana State University, USA

Shuai Zhang, Pacific Northwest National Laboratory, USA

Lin Zhou, Nanjing University, China

Wu Zhou, University of Chinese Academy of Sciences, China


Volume 3|AMRS

Kofi Adu, The Pennsylvania State University, USA

George Bepete, Durham University, UK

David Dodoo-Arhin, University of Ghana, Ghana

Teresa Guraya, University of the Basque Country, Spain

Benjamin Hsiao, Stony Brook University, USA

Said Kenai, University of Blida, Algeria

Shathani S. Nkhwa, University of Botswana, Botswana

Kwadwo Osseo-Asare, The Pennsylvania State University, USA

Mesfin Tsige, The University of Akron, USA


Volume 3|Scientific Basis for Nuclear Waste Management XLI

Principal Editor: Daniel J. Gregg, ANSTO, Australia

Principal Editor: Gregory R. Lumpkin, ANSTO, Australia

Principal Editor: Eric R. Vance, ANSTO, Australia

Principal Editor: Yingjie Zhang, ANSTO, Australia


Volume 3|IMRC 2018

Jesús Ángel Arenas Alatorre, Instituto de Física, UNAM, Mexico

José María Cabrera Marrero, Universitat Politècnica de Catalunya, Spain

Grégory Guisbiers, University of Arkansas at Little Rock, USA

J. Martin Herrera-Ramírez, CIMAV, Mexico

Javier Illescas, CONACYT - Instituto Tecnológico de Toluca, Mexico

Stephanos Konstantinidis, Université de Mons, Belgium

Jorge López-Cuevas, CINVESTAV-IPN, Mexico

Rosendo López González, Universidad Juárez Autonomía de Tabasco, Mexico

Eddie López-Honorato, Centro de Investigación y de Estudios Avanzados del IPN, Unidad Saltillo, Mexico

Yadienka Martinez Rubi, National Research Council of Canada, Canada

Francisco C. Robles-Hernandez, University of Houston, USA

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