Plasma Chemistry and Plasma Processing is an international journal that provides a forum for the publication of original papers on fundamental research and new developments in plasma chemistry and plasma processing. The journal encompasses all types of industrial processing plasmas, ranging from nonthermal plasmas to thermal plasmas, and publishes fundamental plasma studies as well as studies of specific plasma applications. Application contexts of interest include plasma etching in microelectronics and other fields, deposition of thin films and coatings, powder synthesis, environmental processing, lighting, surface modification and others. Includes studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces.

  • An international forum for fundamental research and new developments in plasma chemistry and plasma processing
  • Offers fundamental plasma studies and studies of specific applications
  • Covers plasma etching in microelectronics, deposition of thin films and coatings, powder synthesis, environmental processing, lighting, surface modification and more
  • 96% of authors who answered a survey reported that they would definitely publish or probably publish in the journal again

Journal information

Editor-in-Chief
  • Bruce R. Locke,
  • Anthony Murphy
Publishing model
Hybrid. Open Access options available

Journal metrics

2.768 (2018)
Impact factor
2.717 (2018)
Five year impact factor
98,639 (2019)
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Latest articles

This journal has 29 open access articles

Journal updates

  • COVID-19 and impact on peer review

    As a result of the significant disruption that is being caused by the COVID-19 pandemic we are very aware that many researchers will have difficulty in meeting the timelines associated with our peer review process during normal times.  Please do let us know if you need additional time. Our systems will continue to remind you of the original timelines but we intend to be highly flexible at this time.

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About this journal

Electronic ISSN
1572-8986
Print ISSN
0272-4324
Abstracted and indexed in
  1. CNKI
  2. Chemical Abstracts Service (CAS)
  3. Current Contents Collections / Electronics & Telecommunications Collection
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  5. Current Contents/Physical, Chemical and Earth Sciences
  6. EBSCO Applied Science & Technology Source
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  9. EBSCO Engineering Source
  10. EBSCO STM Source
  11. EI Compendex
  12. Gale
  13. Gale Academic OneFile
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  17. Institute of Scientific and Technical Information of China
  18. Japanese Science and Technology Agency (JST)
  19. Journal Citation Reports/Science Edition
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  21. OCLC WorldCat Discovery Service
  22. ProQuest Central
  23. ProQuest Materials Science and Engineering Database
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  27. ProQuest-ExLibris Summon
  28. SCImago
  29. SCOPUS
  30. Science Citation Index
  31. Science Citation Index Expanded (SciSearch)
  32. Semantic Scholar
  33. WTI Frankfurt eG
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