Editors

Editors-in-Chief:

Trevor M. Benson
Department of Electrical & Electronic Engineering, University of Nottingham, University Park, Nottingham NG7 2RD, UK

Daoxin Dai
Zhejiang University, Center for Optical & Electromagnetic Research, East-Building 5, Zijingang Campus, Hangzhou 310058 China

Marian Marciniak
National Institute of Telecommunications Dept. Transmission and Optical Technology, Szachowa 1, Warsaw 04-894, Poland

 

Executive Editors:

Eugene Avrutin
University of York, Department of Electronics, York, YO10 5DD, UK

Crina Cojocaru 
Universitat Politècnica de Catalunya, Spain

Weida Hu
Shanghai Institute of Technical Physics, Chinese Academy of Sciences, China

Salah Obayya
Zewail City of Science and Technology, 6th of October City, Giza, Egypt

Joachim Piprek
NUSOD Institute LLC, P.O. Box 7204, Newark, DE 19714-7204, USA

Bouchta Sahraoui
University of Angers, UFR Science Lab., POMA of Angers, 49045 Angers, France

Xuelin Yang
State Key Laboratory of Advanced Optical Communication Systems and Networks, Shanghai Jiao Tong University, Shanghai, China

 

Associate Editors:

Mohamed Farahat O. Hameed
Zewail City of Science and Technology, 6th of October City, Giza, Egypt

Aleksandra Kaszubowska-Anandarajah
CONNECT Research Centre, Dunlop Oriel House, Trinity College Dublin, Ireland

Gregory Morozov
Scottish Universities Physics Alliance (SUPA), Institute of Thin Films, Sensors and Imaging, University of the West of Scotland, Paisley PA1 2BE, UK

Zhenggand Lian
Huazhong University of Science and Technology and YOEC, Wuhan, 430205, China

 

Editorial Board:

A. Agrawal, University of Technology Sydney, Australia
V. Ahmadi, Tarbiat Modares University, Iran
Y. K. Baykal, Çankaya University, Turkey
G. Carpintero, Carlos III University, Spain
M. A. Cataluna, Heriot Watt University, UK
P. Cheben, NRC, Canada
V. Dhasarathan, Kathir College of Engineering Coimbatore Tamil Nadu, India
I. Djordjevic, University of Arizona, USA
J. M. Dudley, Université de France-Comté, France
E.M. Feddi, ENSAM, Mohammed V University in Rabat, Morocco
R. Galatus, Technical University of Cluj-Napoca, Romania
M. Hammer, University of Paderborn, Germany
O. Henderson-Sapir, University of Adelaide, Australia
V. Janyani, Malaviya National Institute of Technology (MNIT), India
T. Kaczmarek, Politechnika Świętokrzyska, Poland
P. Kockaert, Université Libre de Bruxelles, Belgium
E. Kriezis, Aristotle University of Thessaloniki, Greece
Y. Lai, Nanjing University, China
J. Latal, VSB-Technical University of Ostrava, Czech Republic
R. Malureanu, Technical University of Denmark, Denmark
J. Mrazek, Czech Academy of Sciences, Czech Republic
M. Pereira, Khalifa University of Science and Technology, UAE
A. Pinto, Universidade de Aveiro, Portugal
F. Prudenzano, Politecnico di Bari, Italy
A. Quandt, University of the Witwatersrand, South Africa
J. Radovanovic, University of Belgrade, Serbia
E. Romanova, Saratov State University, Russia
M. Sciamanna, Supélec Campus de Metz, France
Y. Shi, Zhejiang University, China
C. Sima, Huazhong University of Science and Technology (HUST), China
G. A. Stanciu, University Politehnica of Bucharest, Romania
Y.-H. Su, National Cheng Kung University, Taiwan
S. Sujecki, Wroclaw University of Science and Technology, Poland
T. Sun, City University of London, UK
X. Sun, Chinese University of Hong Kong, China
H. Susanto, University of Essex, UK
M. Vasilevskiy, University of Minho & International Iberian Nanotecnnology Laboratory, Portugal
J. Wang, Peking University, China
P. Wang, Harbin Engineering University, China
L. Xia, Huazhong University of Science and Technology (HUST), China
C. Yu, The Hong Kong Polytechnic University, Hong Kong
Q. Zhou, Wuhan Textile University, China
Q. Zhuge, Shanghai Jiaotong University, China