Editors

Editors:

Richard D. Adams
Dept. of Chemistry, University of South Carolina, Columbia, USA

Gareth Williams
UCL School of Pharmacy, London, United Kingdom

Boon K. Teo
Dept. of Chemistry, Coll.of Chemistry and Chem. Engineering, Xiamen University, Xiamen, China

Associate Editors:

Daniel S. Corrêa
Embrapa Instrumentation - Nanotechnology National Laboratory for Agriculture, Brazilian Agricultural Research Corporation (EMBRAPA), São Carlos, SP, Brazil

Emeritus Editorial Board:

M.I. Bruce, University of Adelaide, South Australia; J.P. Fackler, Texas A&M University, College Station; D. Fenske, Institut für anorganische Chemie der Universität, Karlsruhe, Germany; B.F.G. Johnson, University of Cambridge, UK; G. Longoni, Universita di Bologna, Bologna, Italy; C. M. Lukehart, Dept. of Chemistry, Vanderbilt University, Nashville, TN
; T.C.W. Mak, The Chinese University of Hong Kong, Shatin.


Editorial Board:

B. Captain, University of Miami, Coral Gables; L. Cronin, University of Glasgow, UK;
L.F. Dahl, University of Wisconsin at Madison; V. Fedin, Russian Academy of Sciences, Novosibirsk, Russia; J. Halet, Institut des Sciences Chimiques de Rennes, France; P.D. Harvey, Université de Sherbrooke, QC, Canada; U. Kortz, Jacobs University, Bremen, Germany; J. Li, Tsinghua University, Beijing, PR of China; P. Low, University of Western Australia, Perth, Australia; A. Müller, Universität, Bielefeld, Germany; C.J. Murphy, University of Illinois at Urbana-Champaign; N. Radacsi, The University of Edinburgh, Edinburgh, UK; C.N.R. Rao, Jawaharlal Nehru Centre for Advanced Scientific Research, Jakkur, Bangalore, India; E. Rosenberg, University of Montana, Missoula; J.-Y. Saillard, Universite de Rennes, Rennes, France; G. Schmid, Universität Essen, Germany; G.A. Somorjai, University of California, Berkeley; W.-T. Wong, The Hong Kong Polytechnic University Hung Hom, Kowloon, Hong Kong; V.W.W. Yam, University of Hong Kong, Hong Kong; S. Zacchini, Università di Bologna, Italy; R.Q. Zhang, City University of Hong Kong, Hong Kong; J. Zhao, Dalian University of Technology, Dalian, China