Editors

Editor-in-Chief:

Safa Kasap
University of Saskatchewan, Canada

 

Founding Editor and Former Editor-in-Chief:

Arthur F. W. Willoughby
Southampton University, UK

 

Deputy Editors-in-Chief:

Jun Luo
Chinese Academy of Sciences, China

Patrick J. McNally
Dublin City University, Ireland
Responsible for Research Integrity, including all Comments, Replies, and Complaints

 

Editors:

Peter Capper
Selex ES, UK

Homero Castaneda-Lopez
Texas A&M University, USA

Kalyan Kumar Chattopadhyay
Javadpur University, India

Nandu Chaure
Savitribai Phule Pune University, India

I.M. Dharmadasa
Sheffield Hallam University, UK

Chris Groves
Durham University, UK

C. Robert Kao
National Taiwan University, Taiwan

Maurizio Martino
Università del Salento, Italy

Hiroyoshi Naito
Osaka Prefecture University, Japan

Yun Hau Ng
City University of Hong Kong, Hong Kong

Amlan J. Pal
Indian Association for the Cultivation of Science, India

Henry H. Radamson
Royal Institute of Technology, Sweden

Karthik Shankar
University of Alberta, Canada

Velumani Subramaniam
CINVESTAV, Mexico

Stephen Sweeney
University of Surrey, UK

Hongjing Wu
Northwestern Polytechnical University, China

Wu Yan
China University of Geosciences (Wuhan), China

Takayuki Yanagida
Nara Institute of Science and Technology, Japan

Ying Yang
Tsinghua University, China

Bangmin Zhang
Sun Yat-Sen University, China

Fu Rong Zhu
Hong Kong Baptist University, Hong Kong

 

Assistant Editor:

Chunzi Zhang
University of Saskatchewan, Canada

 

Editorial Board:

Sadao AdachiGunma University, JapanDan AllwoodUniversity of Sheffield, UKHajime AsahiOsaka University, Japan; Mark Baker, University of Surrey, UK; Neil S. Beattie Northumbria University, UK;  Bhaskar Bhattacharya, Banaras Hindu University, India; Rana BiswasAmes Laboratory & Iowa State University, USAAnna Paola Caricato, Università del Salento, Italy; Y.C. (Archie) ChanCity University of Hong Kong, ChinaParthasarathi Chakraborti, Intel Corporation, Hillsboro, Oregon, USA; Kunji ChenNanjing University, ChinaW. (Jim) ChoykeUniversity of Pittsburgh, USAAntonin FejfarAcademy of Sciences of the Czech Republic, Czech RepublicDarrel FrearFreescale Semiconductor, USAJan Evans-FreemanUniversity of Canterbury, New Zealand; Shubhra GangopadhyayUniversity of Missouri-Columbia, USAChristopher GourlayImperial College London, UK; Jong HeoPohang University of Science and Technology, KoreaDan HewakUniversity of Southampton, UK; Oliver Ileperuma, Institute of Chemistry Ceylon, Sri Lanka; Alessia Irrera CNR- Institute for Chemical and Physical Processes (IPCF), Messina, Italy; Stuart J. C. IrvineSwansea University, UK; Chennupati JagadishThe Australian National University, Australia; David JilesIowa State University, USAHannah J. Joyce, Cambridge University, UKZahangir Kabir, Concordia University, Canada; Karen KavanaghSimon Fraser University, CanadaIwan Kityk  Czestochowa University of Technology, Poland; Chien-Neng LiaoNational Tsing Hua University, Taiwan; Leszek MalkinskiUniversity of New Orleans, USA; Budhika Mendis, Durham University, UK;  Maria Mitkova Boise State University, USA;  Yashowanta MohapatraIndian Institute of Technology Kanpur, IndiaHadis MorkoçVirginia Commonwealth University, USAHiroyoshi NaitoOsaka Prefecture University, Japan; Hiroshi Nishikawa, Osaka University, Japan; Habib PathanSavitribai Phule Pune University, India Kristin M. PoduskaMemorial University of Newfoundland, Canada Adithya PrakashIntersil, USA; Jatin Rath Indian Institute of Technology, Madras, India;  Alla Reznik Lakehead University, Thunder Bay, Canada; Ben RuckVictoria University of Wellingon, New Zealand;  Harry RudaUniversity of Toronto, CanadaArie Ruzin Tel Aviv University, Israel; Vasant Sathe, UGC-DAE Consortium for Scientific Research, India; Rajenda Singh Indian Institute of Technology Delhi, India; Rene van SwaaijDelft University of Technology, The NetherlandsKatsuhisa TanakaKyoto University, Japan; Ayse Turak, McMaster University, Canada;  Takashi UchinoKobe University, JapanNeil WhiteUniversity of Southampton, UK Alex (Ya Sha) YiUniversity of Michigan, USA