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Editors

Editor-in-Chief:

Safa Kasap, University of Saskatchewan, Canada

Founding Editor and Former Editor-in-Chief:

Arthur F. W. Willoughby, Southampton University, United Kingdom

Deputy Editor-in-Chief:

Jun Luo, Chinese Academy of Sciences, China

Comments and Ethics Editor:

Asher C. Leff, TauMat, LLC, USA

Editors:

Peter Capper, SELEX Sistemi Integrati, United Kingdom

Homero Castaneda-Lopez, Texas A&M University, United States of America

Kalyan Kumar Chattopadhyay, Javadpur University, India

Nandu Chaure, Savitribai Phule Pune University, India

I.M. Dharmadasa, Sheffield Hallam University, United Kingdom

Chong Leong Gan; Micron Memory Taiwan, Taiwan

Senthil Murugan Ganapathy, University of Southampton, United Kingdom

Chris Groves, Durham University, United Kingdom

Maurizio Martino, Università del Salento, Italy

Hiroyoshi Naito, Osaka Prefecture University, Japan

Yun Hau Ng, City University of Hong Kong, Hong Kong

Henry H. Radamson, Royal Institute of Technology, Sweden

Jatin Rath, Indian Institute of Technology Madras, India

Karthik Shankar, University of Alberta, Canada

Velumani Subramaniam, CINVESTAV, Mexico

Stephen Sweeney, University of Surrey, United Kingdom

Hongjing Wu, Northwestern Polytechnical University, China

Wu Yan, China University of Geosciences (Wuhan), China

Takayuki Yanagida, Nara Institute of Science and Technology, Japan

Ying Yang, Tsinghua University, China

Bangmin Zhang, Sun Yat-Sen University, China

Fu Rong Zhu, Hong Kong Baptist University, Hong Kong

 

Assistant Editor:

Chunzi Zhang, University of Saskatchewan, Canada

 

Editorial Board:

Sadao AdachiGunma University, JapanDan AllwoodUniversity of Sheffield, UKHajime AsahiOsaka University, Japan; Mark Baker, University of Surrey, UK; Neil S. Beattie Northumbria University, UK; Bhaskar Bhattacharya, Banaras Hindu University, India; Rana BiswasAmes Laboratory & Iowa State University, USAAnna Paola Caricato, Università del Salento, Italy; Y.C. (Archie) ChanCity University of Hong Kong, ChinaParthasarathi Chakraborti, Intel Corporation, Hillsboro, Oregon, USA; Kunji ChenNanjing University, ChinaW. (Jim) ChoykeUniversity of Pittsburgh, USAJan Evans-FreemanUniversity of Canterbury, New Zealand; Antonin FejfarAcademy of Sciences of the Czech Republic, Czech RepublicDarrel FrearFreescale Semiconductor, USAShubhra GangopadhyayUniversity of Missouri-Columbia, USAChristopher GourlayImperial College London, UK; Jong HeoPohang University of Science and Technology, KoreaDan HewakUniversity of Southampton, UK; Oliver Ileperuma, Institute of Chemistry Ceylon, Sri Lanka; Alessia Irrera CNR- Institute for Chemical and Physical Processes (IPCF), Messina, Italy; Stuart J. C. IrvineSwansea University, UK; Chennupati JagadishThe Australian National University, Australia; David JilesIowa State University, USAHannah J. Joyce, Cambridge University, UKZahangir Kabir, Concordia University, Canada; Karen KavanaghSimon Fraser University, CanadaIwan Kityk, Czestochowa University of Technology, Poland; Chien-Neng LiaoNational Tsing Hua University, Taiwan; Leszek MalkinskiUniversity of New Orleans, USA; Budhika Mendis, Durham University, UK; Maria Mitkova Boise State University, USA; Yashowanta MohapatraIndian Institute of Technology Kanpur, IndiaHadis MorkoçVirginia Commonwealth University, USAHiroshi Nishikawa, Osaka University, Japan; Habib PathanSavitribai Phule Pune University, IndiaKristin M. PoduskaMemorial University of Newfoundland, CanadaAdithya PrakashIntersil, USA; Jatin Rath Indian Institute of Technology, Madras, India; Alla Reznik Lakehead University, Thunder Bay, Canada; Ben RuckVictoria University of Wellingon, New ZealandHarry RudaUniversity of Toronto, CanadaArie Ruzin Tel Aviv University, Israel; Vasant Sathe, UGC-DAE Consortium for Scientific Research, India; Rajenda Singh Indian Institute of Technology Delhi, India; Rene van SwaaijDelft University of Technology, The NetherlandsKatsuhisa TanakaKyoto University, Japan; Ayse Turak, McMaster University, CanadaTakashi UchinoKobe University, JapanHenk Vrielinck, Ghent University, Belgium; Neil WhiteUniversity of Southampton, UKAlex (Ya Sha) YiUniversity of Michigan, USA; Shuye Zhang, Harbin Institute of Technology, China

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