Editors

Editor-in-Chief:

Safa Kasap
University of Saskatchewan, Canada

Founding Editor and Former Editor-in-Chief:

Arthur F. W. Willoughby
Southampton University, UK

Deputy Editors-in-Chief:

Jun Luo
Chinese Academy of Sciences, China

Patrick J. McNally
Dublin City University, Ireland

Editors:

Peter Capper
Selex ES, UK

Homero Castaneda-Lopez
Texas A&M University, USA

Kalyan Kumar Chattopadhyay
Javadpur University, India

I.M. Dharmadasa
Sheffield Hallam University, UK

Chris Groves
Durham University, UK

C. Robert Kao
National Taiwan University, Taiwan

Maurizio Martino
Università del Salento, Italy

Yun Hau Ng
City University of Hong Kong, Hong Kong

Amlan J. Pal
Indian Association for the Cultivation of Science, India

Henry H. Radamson
Royal Institute of Technology, Sweden

Karthik Shankar
University of Alberta, Canada

Velumani Subramaniam
CINVESTAV, Mexico

Stephen Sweeney
University of Surrey, UK

Hongjing Wu
Northwestern Polytechnical University, China

Wu Yan
China University of Geosciences (Wuhan), China

Ying Yang
Tsinghua University, China

Bangmin Zhang
Sun Yat-Sen University, China

Fu Rong Zhu
Hong Kong Baptist University, Hong Kong

Assistant Editor:

Chunzi Zhang
University of Saskatchewan, Canada

Editorial Board:

Sadao Adachi, Gunma University, Japan; Dan Allwood, University of Sheffield, UK; Hajime Asahi, Osaka University, Japan; Neil S. Beattie Northumbria University, UK; Bhaskar Bhattacharya, Banaras Hindu University, India; Rana Biswas, Ames Laboratory & Iowa State University, USA; Anna Paola Caricato, Università del Salento, Italy; Y.C. (Archie) Chan, City University of Hong Kong, China; Parthasarathi Chakraborti, Intel Corporation, Hillsboro, Oregon, USA; Nandu Chaure, Savitribai Phule Pune University, India; Kunji Chen, Nanjing University, China; W. (Jim) Choyke, University of Pittsburgh, USA; Antonin Fejfar, Academy of Sciences of the Czech Republic, Czech Republic; Darrel Frear, Freescale Semiconductor, USA; Jan Evans-Freeman, University of Canterbury, New Zealand; Shubhra Gangopadhyay, University of Missouri-Columbia, USA; Christopher Gourlay, Imperial College London, UK; Jong Heo, Pohang University of Science and Technology, Korea; Dan Hewak, University of Southampton, UK; Oliver Ileperuma, Institute of Chemistry Ceylon, Sri Lanka; Alessia Irrera CNR- Institute for Chemical and Physical Processes (IPCF), Messina, Italy; Stuart J. C. Irvine, Swansea University, UK; Chennupati Jagadish, The Australian National University, Australia; David Jiles, Iowa State University, USA; Hannah J. Joyce, Cambridge University, UK; Zahangir Kabir; Concordia University, Canada; Karen Kavanagh, Simon Fraser University, Canada; Iwan Kityk Czestochowa University of Technology, Poland; Chien-Neng Liao, National Tsing Hua University, Taiwan; Leszek Malkinski, University of New Orleans, USA; Budhika Mendis Durham University, UK; Maria Mitkova Boise State University, USA; Yashowanta Mohapatra, Indian Institute of Technology Kanpur, India; Hadis Morkoç, Virginia Commonwealth University, USA; Hiroyoshi Naito, Osaka Prefecture University, Japan; Hiroshi Nishikawa, Osaka University, Japan; Habib Pathan, Savitribai Phule Pune University, India; Kristin M. Poduska, Memorial University of Newfoundland, Canada; Adithya Prakash, Intersil, USA; Jatin Rath Indian Institute of Technology, Madras, India; Alla Reznik Lakehead University, Thunder Bay, Canada; Ben Ruck, Victoria University of Wellingon, New Zealand; Harry Ruda, University of Toronto, Canada; Arie Ruzin Tel Aviv University, Israel; Rene van Swaaij, Delft University of Technology, The Netherlands; Katsuhisa Tanaka, Kyoto University, Japan; Ayse Turak, McMaster University, Canada; Takashi Uchino, Kobe University, Japan; Neil White, University of Southampton, UK; Lydia H. Wong, Nanyang Technological University, Singapore; Takayuki Yanagida, Nara Institute of Science and Technology, Japan; Alex (Ya Sha) Yi, University of Michigan, USA