Editors

Editor-in-Chief

Qi-Feng Zhou,Peking University, Beijing, China

Executive Associate Editor

Xiaogong Wang,Tsinghua University, Beijing, China

Associate Editors

Zhibo Li,Qingdao University of Science and Technology, Qingdao, China

Zi-Chen Li,Peking University, Beijing, China

Shiyong Liu,University of Science and Technology of China, Hefei, China

Anchang Shi,McMaster University, Hamilton, Canada

Dujin Wang,Institute of Chemistry, CAS, Beijing, China

Lixiang Wang,Changchun Institute of Applied Chemistry, CAS, Changchun, China

Shouke Yan,Beijing University of Chemical Technology, Beijing, China

Editorial Board

Lijia An,Changchun Institute of Applied Chemistry, CAS, Changchun, China

Dong June Ahn,Korea University, Seoul, Korea

Joona Bang,Korea University, Seoul, Korea

Dario Cavallo,University of Genova, Genova, Italy

Xuesi Chen,Changchun Institute of Applied Chemistry, CAS, Changchun, China

Yongming Chen,Sun Yat-Sen University, Guangzhou, China

Qiang Fu,Sichuan University, Chengdu, China

Changyou Gao,Zhejiang University, Hangzhou, China

Zhibin Guan,University of California, Irvine, USA

Yanchun Han,Changchun Institute of Applied Chemistry, CAS, Changchun, China

Martin Heeney,Imperial College, London, UK

Jianhui Hou,Institute of Chemistry, CAS, Beijing, China

Wenbing Hu,Nanjing University, Nanjing, China

Wei Huang,Northwestern Polytechnical University, Xi’an, China

Lei Jiang,Technical Institute of Physics and Chemistry, CAS, Beijing, China

Bumjoon Kim,Korea Advanced Institute of Science and Technology, Daejeon, Korea

Liangbin Li,University of Science and Technology of China, Hefei, China

Yuesheng Li,Tianjin University, Tianjin, China

Zhen Li,Wuhan University, Wuhan, China

Yunfeng Lu,University of California, Los Angeles, USA

Peter X. Ma,University of Michigan, Ann Arbor, USA

Ravin Narain,University of Alberta, Edmonton, Canada

Moon Jeong Park,Pohang University of Science and Technology, Pohang, Korea

Huisheng Peng,Fudan University, Shanghai, China

Kotaro Satoh,Nagoya University, Nagoya, Japan

Zhengzhong Shao,Fudan University, Shanghai, China

Youqing Shen,Zhejiang University, Hangzhou, China

Ben Zhong Tang,Hong Kong University of Science & Technology, Hong Kong, China

Xinhua Wan,Peking University, Beijing, China

Deyi Wang,Madrid Institute for Advances Studies of Materials, Madrid, Spain

Wei Wang,Nankai University, Tianjin, China

Xianhong Wang,Changchun Institute of Applied Chemistry, CAS, Changchun, China

Yuzhong Wang,Sichuan University, Chengdu, China

Yen Wei,Tsinghua University, Beijing, China

Xuming Xie,Tsinghua University, Beijing, China

Jian Xu,Institute of Chemistry, CAS, Beijing, China

Wantai Yang,Beijing University of Chemical Technology, Beijing, China

Zhenzhong Yang,Tsinghua University, Beijing, China

Guangzhao Zhang,South China University of Technology, Guangzhou, China

Xi Zhang,Tsinghua University, Beijing, China

Tong Zhao,Institute of Chemistry, CAS, Beijing, China

Yue Zhao,University of Sherbrooke, Sherbrooke, Canada

Qiang Zheng,Zhejiang University, Hangzhou, China

Xinyuan Zhu,Shanghai Jiao Tong University, Shanghai, China

International Advisory Board

A. C. Albertsson,Royal Institute of Technology, Stockholm, Sweden

S. Z. D. Cheng,University of Akron, Akron, USA

T. L. Choi,Seoul National University, Seoul, Korea

P. Coates,University of Bradford, Bradford, UK

J. P. Gong,Hokkaido University, Sapporo, Japan

A. R. Khokhlov,Moscow State University, Moscow, Russia

J. F. Lutz,Institute Charles Sadron, CNRS, Strasbourg, France

K. Matyjaszewski,Carnegie Mellon University, Pittsburgh, USA

A. J. Müller,University of the Basque Country UPV/EHU, Donostia-San Sebastian, Spain

P. Theato,Karlsruhe Institute of Technology, Karlsruhe, Germany

T. P. Russell,University of Massachusetts, Amherst, USA

M. Sawamoto,Kyoto University, Kyoto, Japan

W. Z. Y. Wang,Carleton University, Ottawa, Canada

A. K. Whittaker, The University of Queensland, Brisbane, Australia

Director of Editorial Office

Yingjuan Huang