NanoScience and Technology

Physical Design and Mask Synthesis for Directed Self-Assembly Lithography

Authors: Shim, Seongbo, Shin, Youngsoo

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  • Introduces a highly promising patterning solution for next generation technology
  • Provides a comprehensive overview of directed self-assembly lithography (DSAL) friendly physical design and DSAL-aware mask synthesis
  • Written by leading developers of this technology
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eBook 93,08 €
price for Spain (gross)
  • ISBN 978-3-319-76294-4
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Hardcover 114,39 €
price for Spain (gross)
Softcover 114,39 €
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About this book

This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.

About the authors

Seongbo Shim received B.S. and M.S. degrees in physics from Seoul National University, Korea, in 2004 and 2006 respectively, and a Ph.D. in electrical engineering from KAIST, Korea, in 2016. From 2006 to 2012, he was with the Semiconductor R&D Center, Samsung Electronics, where he was a Senior Engineer working on photolithography, computational lithography, optical proximity correction (OPC), and design for manufacturability (DFM) for advanced technologies. He has authored more than 40 papers on lithography, OPC, and DFM. He is the holder of 15 patents. His research interests include mask synthesis algorithms, VLSI CAD for the design-manufacturing interface, design technology co-optimization (DTCO) for emerging technologies, and machine learning for lithography optimizations.

Youngsoo Shin received B.S., M.S., and Ph.D. degrees in Electronics Engineering from Seoul National University, Korea. From 2001 to 2004, he was a Research Staff Member at the IBM T. J. Watson Research Center, Yorktown Heights, NY, USA. In 2004, he joined the Department of Electrical Engineering, KAIST, Korea, where he is currently a professor. He has served as a Program Chair of ICCD in 2014 and VLSI-SoC in 2015, and as a General Chair of ASP-DAC in 2018. He is an associate editor of IEEE Transactions on CAD and IEEE Design and Test. He is an IEEE Fellow.

Table of contents (10 chapters)

Table of contents (10 chapters)

Buy this book

eBook 93,08 €
price for Spain (gross)
  • ISBN 978-3-319-76294-4
  • Digitally watermarked, DRM-free
  • Included format: PDF, EPUB
  • Immediate eBook download after purchase and usable on all devices
  • Bulk discounts available
Hardcover 114,39 €
price for Spain (gross)
Softcover 114,39 €
price for Spain (gross)
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Bibliographic Information

Bibliographic Information
Book Title
Physical Design and Mask Synthesis for Directed Self-Assembly Lithography
Authors
Series Title
NanoScience and Technology
Copyright
2018
Publisher
Springer International Publishing
Copyright Holder
Springer International Publishing AG, part of Springer Nature
eBook ISBN
978-3-319-76294-4
DOI
10.1007/978-3-319-76294-4
Hardcover ISBN
978-3-319-76293-7
Softcover ISBN
978-3-030-09455-3
Series ISSN
1434-4904
Edition Number
1
Number of Pages
XIV, 138
Number of Illustrations
38 b/w illustrations, 54 illustrations in colour
Topics