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Engineering - Electronics & Electrical Engineering | Russian Microelectronics

Russian Microelectronics

Russian Microelectronics

Editor-in-Chief: Alexander A. Orlikovsky

ISSN: 1063-7397 (print version)
ISSN: 1608-3415 (electronic version)

Journal no. 11180

  • Official Journal of the Russian Academy of Sciences
  • Examines the physical and technological aspects of microelectronics and nanoelectronics as well as select VLSI and ULSI circuit-technical aspects
  • Presents new trends in submicron optical, x-ray, electron, and ion beam lithography technology; dry processing techniques; etching; doping; and deposition and planarization technology

Russian Microelectronics (Mikroelektronika) covers the physical, technological, and some VLSI and ULSI circuit-technical aspects of microelectronics and nanoelectronics; it informs the reader of new trends in submicron optical, x-ray, electron, and ion-beam lithography technology, dry processing techniques, etching, doping, and deposition and planarization technology. Significant space is devoted to problems arising in the application of proton, electron, and ion beams, plasma, etc. Consideration is given to new equipment, including cluster tools and control in situ and submicron CMOS, bipolar, and BICMOS technologies. The journal presents papers addressing problems of molecular beam epitaxy and related processes, heterojunction devices and integrated circuits, the technology and devices of nanoelectronics, and the fabrication of nanometer scale devices, including new device structures, quantum-effect devices, and superconducting devices. The reader will find papers containing news of the diagnostics of surfaces and microelectronic structures, the modeling of technological processes and devices in micro- and nanoelectronics, includeng nanotransistors, and solid state realizations of qubits.
The journal is intended for specialists at research institutes, universities, and other educational establishments; for graduate students; and, to a certain extent, for those working at industrial laboratories.

Related subjects » Electronics & Electrical Engineering

Abstracted/Indexed in 

SCOPUS, INSPEC, Chemical Abstracts Service (CAS), Google Scholar, Academic OneFile, CNKI, Current Abstracts, Current Contents Collections / Electronics & Telecommunications Collection, EBSCO Academic Search, EBSCO Applied Science & Technology Source, EBSCO Computers & Applied Sciences Complete, EBSCO Engineering Source, EBSCO STM Source, EBSCO TOC Premier, EI-Compendex, Gale, OCLC, ProQuest Materials Science & Engineering Database, ProQuest SciTech Premium Collection, ProQuest Technology Collection, SCImago, Summon by ProQuest, Thomson Reuters (ISI)

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    Russian Microelectronics (Mikroelektronika) covers the physical, technological, and some VLSI and ULSI circuit-technical aspects of microelectronics and nanoelectronics; it informs the reader of new trends in submicron optical, x-ray, electron, and ion-beam lithography technology, dry processing techniques, etching, doping, and deposition and planarization technology. Significant space is devoted to problems arising in the application of proton, electron, and ion beams, plasma, etc. Consideration is given to new equipment, including cluster tools and control in situ and submicron CMOS, bipolar, and BICMOS technologies. The journal presents papers addressing problems of molecular beam epitaxy and related processes, heterojunction devices and integrated circuits, the technology and devices of nanoelectronics, and the fabrication of nanometer scale devices, including new device structures, quantum-effect devices, and superconducting devices. The reader will find papers containing news of the diagnostics of surfaces and microelectronic structures, the modeling of technological processes and devices in micro- and nanoelectronics, includeng nanotransistors, and solid state realizations of qubits.
    The journal is intended for specialists at research institutes, universities, and other educational establishments; for graduate students; and, to a certain extent, for those working at industrial laboratories.

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    Original Russian Edition Copyright © 2010 by the Russian Academy of Sciences and the Institute of Physics and Technology.

    Copyright © 2010 by Pleiades Publishing, Ltd.