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Chemistry - Inorganic Chemistry | Plasma Chemistry and Plasma Processing – incl. option to publish open access (Editorial Board)

Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing

Editor-in-Chief: B.R. Locke; A. Murphy

ISSN: 0272-4324 (print version)
ISSN: 1572-8986 (electronic version)

Journal no. 11090

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Anthony B. Murphy
CSIRO Manufacturing
Sydney NSW, Australia

Bruce R. Locke
Department of Chemical and Biomedical Engineering, FAMU-FSU College of Engineering
Florida State University
Tallahassee, Florida, USA

Founding Editors:

Emil Pfender
Department of Mechanical Engineering, University of Minnesota
Minneapolis, Minnesota, USA

Stan Veprek
Department of Chemistry, Technical University Munich
Garching, Germany

Editorial Board:

J. P. Badyal, University of Durham, Durham, England; A. Bogaerts, University of Antwerp, Antwerp, Belgium; M. Boulos, University of Sherbrooke, QC, Canada; P. Bruggeman, University of Minnesota, Minnesota, USA; M. Capitelli, University of Bari, Bari, Italy; S. Coulombe, McGill University, Montreal, Canada; P. Fauchais, University of Limoges, Limoges, France; S. Girshick, University of Minnesota, Minnesota, USA; D. B. Graves, University of California, Berkeley, USA; D. Hegemann, EMPA, Swiss Federal Laboratories for Materials Science and Technology, St. Gallen, Switzerland; M. Hrabovsky, Academy of Sciences of the Czech Republic, Prague, Czech Republic; M. Kong, Old Dominion University, Norfolk, Virginia, USA; D. Loffhagen, Leibniz Institute for Plasma Science and Technology, Greifswald, Germany; S. Mededovic Thagard, Clarkson University, Potsdam, NY, USA.; R. Morent, Ghent University, Ghent, Belgium; J. Mostaghimi, University of Toronto, Toronto, Canada; T. Nozaki, Tokyo Institute of Technology, Tokyo, Japan; M. Sankaran, Case Western Reserve University, Cleveland, OH, USA; A. Vardelle, Universite de Limoges, Limoges, France; J. C. Whitehead, University of Manchester, Manchester, England.

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  • Aims and Scope

    Aims and Scope


    Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, this journal includes industrial processing plasmas ranging from nonthermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Applications are welcome on plasma etching in microelectronics and other fields, deposition of thin films and coatings, powder synthesis, biological applications of plasmas including plasma medicine, environmental processing, lighting, surface modification and others. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited.

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