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  • © 1982

Very Large Scale Integration (VLSI)

Fundamentals and Applications

Editors:

Part of the book series: Springer Series in Electronics and Photonics (SSEP, volume 5)

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Table of contents (11 chapters)

  1. Front Matter

    Pages I-XI
  2. Introduction

    • D. F. Barbe
    Pages 1-3
  3. VLSI Device Fundamentals

    • J. L. Prince
    Pages 4-41
  4. Advanced Lithography

    • R. K. Watts
    Pages 42-88
  5. Computer Aided Design for VLSI

    • P. Losleben
    Pages 89-127
  6. VLSI Architecture

    • E. Swartzlander
    Pages 178-221
  7. VLSI Applications and Testing

    • H. H. Whalen
    Pages 222-254
  8. VHSIC Technology and Systems

    • D. F. Barbe, E. C. Urban
    Pages 255-271
  9. VLSI in Other Countries

    • R. I. Scace
    Pages 273-293
  10. Erratum to: Advanced Lithography

    • David F. Barbe
    Pages 295-295
  11. Back Matter

    Pages 295-304

About this book

Even elementary school students of today know that electronics can do fan­ tastic things. Electronic calculators make arithmetic easy. An electronic box connected to your TV set provides a wonderful array of games. Electronic boxes can translate languages! Electronics has even changed watches from a pair of hands to a set of digits. Integrated circuit (IC) chips, which use transistors to store information in binary form and perform binary arithmetic, make all of this possible. In just a short twenty years, the field of inte­ grated circuits has progressed from chips containing several transistors performing simple functions such as OR and AND functions to chips presently available which contain thousands of transistors performing a wide range of memory, control and arithmetic functions. In the late 1970's Very Large Scale Integration (VLSI) caught the imagin­ ation of the industrialized world. The United States, Japan and other coun­ tries now have substantial efforts to push the frontier of microelectronics across the one-micrometer barrier and into sub-micrometer features. The achievement of this goal will have tremendous impl ications, both technolo­ gical and economic for the countries involved.

Editors and Affiliations

  • Office of ASN (R,E&S), The Pentagon, USA

    David F. Barbe

Bibliographic Information

Buy it now

Buying options

eBook USD 84.99
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book USD 109.99
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Other ways to access