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Molecular Beam Epitaxy

Fundamentals and Current Status

  • Textbook
  • © 1996

Overview

Part of the book series: Springer Series in Materials Science (SSMATERIALS, volume 7)

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Table of contents (8 chapters)

  1. Background Information

  2. Technological Equipment

  3. Characterization Methods

  4. MBE Growth Process

  5. Conclusion

Keywords

About this book

Molecular Beam Epitaxy describes a technique in wide-spread use for the production of high-quality semiconductor devices. It discusses the most important aspects of the MBE apparatus, the physics and chemistry of the crystallization of various materials and device structures, and the characterization methods that relate the structural parameters of the grown (or growing) film or structure to the technologically relevant procedure. In this second edition two new fields have been added: crystallization of as-grown low-dimensional heterostructures, mainly quantum wires and quantum dots, and in-growth control of the MBE crystallization process of strained-layer structures. Out-of-date material has been removed.

Authors and Affiliations

  • Institute of Physics, Polish Academy of Sciences, Warszawa, Poland

    Marian A. Herman

  • Institute of Vacuum Technology, Warszawa, Poland

    Marian A. Herman

  • Institut für Experimentalphysik, Johannes Kepler Universität, Linz/Auhof, Austria

    Helmut Sitter

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