Authors:
- Systematically describes laser heat-mode lithography, addressing the basic principles, lithography system, manipulation of feature size, grayscale lithography, resist thin films, and pattern transfer
- Presents the latest research results on laser heat-mode nanolithography and grayscale lithography
- Provides a sound method for arbitrarily tuning the lithographic feature size from nanoscale to micrometer without changing the laser spot size
- Provides a feasible technique for high-speed large-area micro/nano-fabrication of arbitrary pattern structures
Part of the book series: Springer Series in Materials Science (SSMATERIALS, volume 291)
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Table of contents (9 chapters)
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Front Matter
About this book
This book provides a systematic description and analysis of laser heat-mode lithography, addressing the basic principles, lithography system, manipulation of feature size, grayscale lithography, resist thin films, and pattern transfer, while also presenting typical experimental results and applications. It introduces laser heat-mode lithography, where the resist thin films are essentially an opto-thermal response to the laser beam with changeable wavelength and are not sensitive to laser wavelength. Laser heat-mode lithography techniques greatly simplify production procedures because they require neither a particular light source nor a particular environment; further, there are no pre-baking and post-baking steps required for organic photoresists. The pattern feature size can be either larger or smaller than the laser spot by adjusting the writing strategy. The lithographic feature size can also be arbitrarily tuned from nanoscale to micrometer without changing the laser spot size.Lastly, the line edge roughness can be controlled at a very low value because the etching process is a process of breaking bonds among atoms. The book offers an invaluable reference guide for all advanced undergraduates, graduate students, researchers and engineers working in the fields of nanofabrication, lithography techniques and systems, phase change materials, etc.
Authors and Affiliations
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Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, China
Jingsong Wei
About the author
Jingsong Wei received the Ph.D. degree in Chinese Academy of Sciences. He is currently a Professor with Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences. He has published more than 120 articles in professional journals including Applied Physics Letters, Optics Express, Optics Letters, etc. His research interests include miro/nanolithography, super-resolution optics, and optical instruments.
Bibliographic Information
Book Title: Laser Heat-Mode Lithography
Book Subtitle: Principle and Methods
Authors: Jingsong Wei
Series Title: Springer Series in Materials Science
DOI: https://doi.org/10.1007/978-981-15-0943-8
Publisher: Springer Singapore
eBook Packages: Physics and Astronomy, Physics and Astronomy (R0)
Copyright Information: Springer Nature Singapore Pte Ltd. 2019
Hardcover ISBN: 978-981-15-0942-1Published: 29 November 2019
Softcover ISBN: 978-981-15-0945-2Published: 29 November 2020
eBook ISBN: 978-981-15-0943-8Published: 20 November 2019
Series ISSN: 0933-033X
Series E-ISSN: 2196-2812
Edition Number: 1
Number of Pages: XIII, 208
Number of Illustrations: 22 b/w illustrations, 160 illustrations in colour
Topics: Surface and Interface Science, Thin Films, Optics, Lasers, Photonics, Optical Devices, Microwaves, RF and Optical Engineering, Optical and Electronic Materials