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Advances in Rapid Thermal and Integrated Processing

  • Book
  • © 1996

Overview

Editors:
  1. Fred Roozeboom

    1. Philips Research Laboratories, Eindhoven, The Netherlands

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Part of the book series: NATO Science Series E: (NSSE, volume 318)

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Table of contents (19 chapters)

  1. Front Matter

    Pages i-xii
    Download chapter PDF

  2. Introduction: History and Perspectives of Rapid Thermal Processing

    • Fred Roozeboom
    Pages 1-34

  3. The Thermal Radiative Properties of Semiconductors

    • P. J. Timans
    Pages 35-101

  4. Wafer Temperature Measurement in RTP

    • Chuck Schietinger
    Pages 103-123

  5. Wafer Emissivity In RTP

    • Chuck Schietinger
    Pages 125-141

  6. Temperature and Process Control in Rapid Thermal Processing

    • J.-M. Dilhac
    Pages 143-162

  7. Single-Wafer Process Integration and Process Control Techniques

    • Mehrdad M. Moslehi, Yong Jin Lee, Charles Schaper, Thomas Omstead, Lino Velo, Ahmad Kermani et al.
    Pages 163-192

  8. Rapid Thermal O2-Oxidation and N2O-Oxynitridation

    • Martin L. Green
    Pages 193-215

  9. Integrated Pre-Gate Dielectric Cleaning and Surface Preparation

    • Yi Ma, Martin L. Green
    Pages 217-234

  10. Dielectric Photoformation on Si and SiGe

    • Ian W. Boyd
    Pages 235-264

  11. Modeling Strategies for Rapid Thermal Processing: Finite Element and Monte Carlo Methods

    • K. F. Jensen, T. P. Merchant, J. V. Cole, J. P. Hebb, K. L. Knutson, T. G. Mihopoulos
    Pages 265-304

  12. Modeling Approaches for Rapid Thermal Chemical Vapor Deposition

    • K. F. Jensen, H. Simka, T. G. Mihopoulos, P. Futerko, M. Hierlemann
    Pages 305-331

  13. Silicidation and Metallization Issues Using Rapid Thermal Processing

    • K. Maex
    Pages 333-374

  14. Rapid Thermal Multiprocessing for a Programmable Factory for Manufacturing of ICs

    • Krishna C. Saraswat
    Pages 375-413

  15. RTCVD Integrated Processing for Photovoltaic Application

    • E. Conrad, P. Müller, A. Kermani
    Pages 415-429

  16. Equipment Design, Cluster Tools and Scale-Up Issues

    • L. Deutschmann, F. Glowacki
    Pages 431-441

  17. Rapid Thermal Chemical Vapour Deposition of Epitaxial Si and SiGe

    • W. B. de Boer
    Pages 443-463

  18. The Evolving Role of Rapid Thermal Processing for Deep Submicron Devices

    • Bohumil Lojek
    Pages 465-491

  19. Rapid Thermal Processing of Contacts and Buffer Layers for Compound Semiconductor Device Technology

    • Ting Feng, Aris Christou, D. Girginoudi, Z. Hatzopoulos
    Pages 493-520

  20. Rapid Thermal Processing of Magnetic Thin Films for Data Storage Devices

    • Fred Roozeboom
    Pages 521-552
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Keywords

About this book

Rapid thermal and integrated processing is an emerging single-wafer technology in ULSI semiconductor manufacturing, electrical engineering, applied physics and materials science. Here, the physics and engineering of this technology are discussed at the graduate level. Three interrelated areas are covered. First, the thermophysics of photon-induced annealing of semiconductor and related materials, including fundamental pyrometry and emissivity issues, the modelling of reactor designs and processes, and their relation to temperature uniformity. Second, process integration, treating the advances in basic equipment design, scale-up, integrated cluster-tool equipment, including wafer cleaning and integrated processing. Third, the deposition and processing of thin epitaxial, dielectric and metal films, covering selective deposition and epitaxy, integrated processing of layer stacks, and new areas of potential application, such as the processing of III-V semiconductor structures and thin- film head processing for high-density magnetic data storage.

Editors and Affiliations

  • Philips Research Laboratories, Eindhoven, The Netherlands

    Fred Roozeboom

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