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Nanolithography

A Borderland between STM, EB, IB, and X-Ray Lithographies

  • Book
  • © 1994

Overview

Editors:
  1. M. Gentili

    1. CNR-Instituto di Elettronica dello Stato Solido, Roma, Italy

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  2. C. Giovannella

    1. Dipartimento di Fisica, Università di Roma “Tor Vergata”, Roma, Italy

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  3. S. Selci

    1. CNR-Instituto di Struttura della Materia, Frascati, Roma, Italy

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Part of the book series: NATO Science Series E: (NSSE, volume 264)

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Table of contents (21 chapters)

  1. Front Matter

    Pages i-xii
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  2. Electron Beam Lithography

    1. Nanolithography, The Integrated System

      • Fritz J. Hohn
      Pages 1-11

    2. Electron Beam Resists and Pattern Transfer Methods

      • Michael Hatzakis
      Pages 13-23

    3. Nanolithography Developed Through Electron-Beam-Induced Surface Reaction

      • Shinji Matsui, Yukinori Ochiai, Masakazu Baba, Heiji Watanabe
      Pages 25-43

    4. Direct Writing of Nanoscale Patterns in SiO2

      • Xiaodan Pan, A. N. Broers
      Pages 45-51

    5. Sub-10nm Electron Beam Lithography: -AIF3-Doped Lithium Fluoride as a Resist

      • Wolfram Langheinrich, Heinz Beneking
      Pages 53-66

    6. Surface Imaging for EB-Nanolithography

      • M. Böttcher, L. Bauch, A. Wolff, W. Höppner
      Pages 67-72

    7. Patterning of InGaAs/GaAs Quantum Dots Using E-Beam Lithography and Selective Removal of the Top Barrier

      • A. Schmidt, F. Faller, A. Forchel
      Pages 73-76

    8. Fabrication of Ultrasmall InGaAs/InP Nanostructures by High Voltage Electron Beam Lithography and Wet Chemical Etching

      • P. Ils, M. Michel, A. Forchel, I. Gyuro, P. Speier, E. Zielinski
      Pages 77-80

    9. Fabrication, investigation and manipulation of artificial nanostructures

      • A. Menschig, F. E. Prins, G. Lehr, R. Bergmann, J. Hommel, U. A. Griesinger et al.
      Pages 81-85

    10. Nano-Lithography in 3 Dimensions with Electron Beam Induced Deposition

      • H. W. P. Koops, M. Rudolph, J. Kretz, M. Weber
      Pages 87-93

    11. Nanolithography Requirements — An Equipment Manufacturers View

      • B. A. Wallman, P. G. Crawley
      Pages 95-101

  3. X-Ray Lithography

    1. X-Ray Nanolithography: Limits, and Application to Sub-100 NM Manufacturing

      • Henry I. Smith, M. L. Schattenburg
      Pages 103-119

    2. X-ray Phase Shifting Masks

      • F. Cerrina, J. Xiao, Z. Y. Guo
      Pages 121-127

    3. Fabrication of X-ray mask for nanolithography by EBL

      • M. Gentili
      Pages 129-136

  4. Ion Beam Lithography

    1. Intense Focused Ion Beams for Nanostructurisation

      • S. Kalbitzer, Ch. Wilbertz, Th. Miller
      Pages 137-147

    2. Latest Results Obtained with the Alpha Ion Projection Machine

      • W. Fallmann, A. Bruckner, E. Cekan, W. Friza, F. Paschke, G. Stangl et al.
      Pages 149-158

  5. STM Lithography

    1. Direct Writing with a Combined STM/SEM System

      • A. L. de Lozanne, W. F. Smith, E. E. Ehrichs
      Pages 159-174

    2. Low Voltage e-Beam Lithography with the Scanning Tunneling Microscope

      • C. R. K. Marrian, F. K. Perkins, S. L. Brandow, T. S. Koloski, E. A. Dobisz, J. M. Calvert
      Pages 175-188

    3. STM Nanolithography and Characterization of Passivated Silicon and Gallium Arsenide

      • J. A. Dagata
      Pages 189-196
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Keywords

About this book

Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography.
Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).

Editors and Affiliations

  • CNR-Instituto di Elettronica dello Stato Solido, Roma, Italy

    M. Gentili

  • Dipartimento di Fisica, Università di Roma “Tor Vergata”, Roma, Italy

    C. Giovannella

  • CNR-Instituto di Struttura della Materia, Frascati, Roma, Italy

    S. Selci

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