Editors:
Part of the book series: NATO Science Series II: Mathematics, Physics and Chemistry (NAII, volume 55)
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Table of contents (14 chapters)
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Front Matter
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Back Matter
About this book
An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes.
A handbook for engineers and scientists and an introduction for students of microelectronics.
Editors and Affiliations
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School of Electrochemical and Electrometallurgical Engineering, National Polytechnic Institute of Grenoble, Grenoble, France
Yves Pauleau
Bibliographic Information
Book Title: Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies
Editors: Yves Pauleau
Series Title: NATO Science Series II: Mathematics, Physics and Chemistry
DOI: https://doi.org/10.1007/978-94-010-0353-7
Publisher: Springer Dordrecht
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eBook Packages: Springer Book Archive
Copyright Information: Kluwer Academic Publishers 2002
Hardcover ISBN: 978-1-4020-0524-4Published: 30 April 2002
Softcover ISBN: 978-1-4020-0525-1Published: 30 April 2002
eBook ISBN: 978-94-010-0353-7Published: 06 December 2012
Series ISSN: 1568-2609
Edition Number: 1
Number of Pages: XIII, 363
Topics: Surfaces and Interfaces, Thin Films, Physical Chemistry, Industrial Chemistry/Chemical Engineering