The primary thrust of very large scale integration (VLS!) is the miniaturization of devices to increase packing density, achieve higher speed, and consume lower power. The fabrication of integrated circuits containing in excess of four million components per chip with design rules in the submicron range has now been made possible by the introduction of innovative circuit designs and the development of new microelectronic materials and processes. This book addresses the latter challenge by assessing the current status of the science and technology associated with the production of VLSI silicon circuits. It represents the cumulative effort of experts from academia and industry who have come together to blend their expertise into a tutorial overview and cohesive update of this rapidly expanding field. A balance of fundamental and applied contributions cover the basics of microelectronics materials and process engineering. Subjects in materials science include silicon, silicides, resists, dielectrics, and interconnect metallization. Subjects in process engineering include crystal growth, epitaxy, oxidation, thin film deposition, fine-line lithography, dry etching, ion implantation, and diffusion. Other related topics such as process simulation, defects phenomena, and diagnostic techniques are also included. This book is the result of a NATO-sponsored Advanced Study Institute (AS!) held in Castelvecchio Pascoli, Italy. Invited speakers at this institute provided manuscripts which were edited, updated, and integrated with other contributions solicited from non-participants to this AS!.

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Editors and Affiliations

AT & T Bell Laboratories, Murray Hill, USA

R. A. Levy

Bibliographic Information

Book Title: Microelectronic Materials and Processes
Editors: R. A. Levy
Series Title: NATO Science Series E:
DOI: https://doi.org/10.1007/978-94-009-0917-5
Publisher: Springer Dordrecht
eBook Packages: Springer Book Archive
Copyright Information: Kluwer Academic Publishers 1989
Hardcover ISBN: 978-0-7923-0147-9Published: 31 January 1989
Softcover ISBN: 978-0-7923-0154-7Published: 31 January 1989
eBook ISBN: 978-94-009-0917-5Published: 06 December 2012
Series ISSN: 0168-132X
Edition Number: 1
Number of Pages: 1000
Topics: Optical and Electronic Materials, Characterization and Evaluation of Materials

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Table of contents (16 chapters)

Front Matter

Back Matter

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