Overview
- Is the first book that focuses on an etching profile prediction system from a practical application viewpoint
- Explains the development of an effective on-wafer UV sensor, on-wafer charge-up sensor and on-wafer sheath shape sensor
- Contributes to a better understanding of etching profile prediction systems, including several experimental findings
- Includes supplementary material: sn.pub/extras
Part of the book series: SpringerBriefs in Applied Sciences and Technology (BRIEFSAPPLSCIENCES)
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Table of contents (4 chapters)
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Front Matter
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Back Matter
Keywords
About this book
This book provides for the first time a good understanding of the etching profile technologies that do not disturb the plasma. Three types of sensors are introduced: on-wafer UV sensors, on-wafer charge-up sensors and on-wafer sheath-shape sensors in the plasma processing and prediction system of real etching profiles based on monitoring data. Readers are made familiar with these sensors, which can measure real plasma process surface conditions such as defect generations due to UV-irradiation, ion flight direction due to charge-up voltage in high-aspect ratio structures and ion sheath conditions at the plasma/surface interface. The plasma etching profile realistically predicted by a computer simulation based on output data from these sensors is described.
Authors and Affiliations
About the author
Distinguished Professor in Tohoku University
Professor in Institute of Fluid Science,
Professor and Principal Investigator, WPI-AIMR in Tohoku University.
Bibliographic Information
Book Title: Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System
Authors: Seiji Samukawa
Series Title: SpringerBriefs in Applied Sciences and Technology
DOI: https://doi.org/10.1007/978-4-431-54795-2
Publisher: Springer Tokyo
eBook Packages: Engineering, Engineering (R0)
Copyright Information: The Author(s) 2014
Softcover ISBN: 978-4-431-54794-5Published: 17 February 2014
eBook ISBN: 978-4-431-54795-2Published: 28 January 2014
Series ISSN: 2191-530X
Series E-ISSN: 2191-5318
Edition Number: 1
Number of Pages: VIII, 40
Number of Illustrations: 5 b/w illustrations, 30 illustrations in colour
Topics: Nanotechnology and Microengineering, Nanoscale Science and Technology, Nanotechnology, Plasma Physics, Semiconductors