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Process Technology for Semiconductor Lasers

Crystal Growth and Microprocesses

  • Book
  • © 1996

Overview

Authors:
  1. Kenichi Iga

    1. Precision and Intelligence Laboratory, Tokyo Institute of Technology, Midori-ku, Yokohama 226, Japan

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  2. Susumu Kinoshita

    1. Precision and Intelligence Laboratory, Tokyo Institute of Technology, Midori-ku, Yokohama 226, Japan

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    You can also search for this author in PubMed   Google Scholar

Part of the book series: Springer Series in Materials Science (SSMATERIALS, volume 30)

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Table of contents (10 chapters)

  1. Front Matter

    Pages I-X
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  2. Introduction

    • Kenichi Iga, Susumu Kinoshita
    Pages 1-7

  3. Materials for Semiconductor Lasers

    • Kenichi Iga, Susumu Kinoshita
    Pages 8-21

  4. Basic Design of Semiconductor Lasers

    • Kenichi Iga, Susumu Kinoshita
    Pages 22-42

  5. Epitaxy of III–V Compound Semiconductors

    • Kenichi Iga, Susumu Kinoshita
    Pages 43-50

  6. Liquid Phase Epitaxy and Growth Technology

    • Kenichi Iga, Susumu Kinoshita
    Pages 51-81

  7. Vapor Phase and Beam Epitaxies

    • Kenichi Iga, Susumu Kinoshita
    Pages 82-100

  8. Characterization of Laser Materials

    • Kenichi Iga, Susumu Kinoshita
    Pages 101-111

  9. Semiconductor-Laser Devices — Fabrication and Characteristics

    • Kenichi Iga, Susumu Kinoshita
    Pages 112-123

  10. Mode-Control Techniques in Semiconductor Lasers

    • Kenichi Iga, Susumu Kinoshita
    Pages 124-146

  11. Surface-Emitting Lasers

    • Kenichi Iga, Susumu Kinoshita
    Pages 147-154

  12. Back Matter

    Pages 155-172
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Keywords

About this book

Process Technology for Semiconductor Lasers describes the design principles of semiconductor lasers, mainly from the fabrication point of view. A review is given of the history of semiconductor-laser development and applications and of the materials used in lasing at short to long wavelengths. The basic design principles for semiconductor-laser devices and the epitaxy for laser production are discussed. An entire chapter is devoted to the technology of liquid-phase epitaxy, and another one to vapor-phase and beam epitaxies. The characterizations of laser materials and the fabrication and characteristics of semiconductor lasers are treated. Mode-control techniques are presented, and surface-emitting lasers are introduced in the final chapter.

Authors and Affiliations

  • Precision and Intelligence Laboratory, Tokyo Institute of Technology, Midori-ku, Yokohama 226, Japan

    Kenichi Iga, Susumu Kinoshita

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