Authors:
- The reader will obtain updated information for not only deep-submicron ULSIs having nanometer-range ultrathin gate- dielectrics but also nitrided oxides from this first book presenting them in detail so as to reach the present high state of the art.
Part of the book series: Springer Series in Electronics and Photonics (SSEP, volume 34)
Buy it now
Buying options
Tax calculation will be finalised at checkout
Other ways to access
This is a preview of subscription content, log in via an institution to check for access.
Table of contents (6 chapters)
-
Front Matter
-
Back Matter
About this book
Authors and Affiliations
-
Kyoto Research Laboratory, Matsushita Electronics, Inc., Minami-ku,Kyoto, Japan
Takashi Hori
Bibliographic Information
Book Title: Gate Dielectrics and MOS ULSIs
Book Subtitle: Principles, Technologies and Applications
Authors: Takashi Hori
Series Title: Springer Series in Electronics and Photonics
DOI: https://doi.org/10.1007/978-3-642-60856-8
Publisher: Springer Berlin, Heidelberg
-
eBook Packages: Springer Book Archive
Copyright Information: Springer-Verlag Berlin Heidelberg 1997
eBook ISBN: 978-3-642-60856-8Published: 06 December 2012
Series ISSN: 0172-5734
Edition Number: 1
Number of Pages: XIV, 352
Topics: Condensed Matter Physics, Optical and Electronic Materials