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EMC 2008

Vol 2: Materials Science

  • Conference proceedings
  • © 2008

Overview

Editors:
  1. Silvia Richter

    1. Central Facility for Electron Microscopy, RWTH Aachen, Aachen, Germany

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  2. Alexander Schwedt

    1. Central Facility for Electron Microscopy, RWTH Aachen, Aachen, Germany

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    You can also search for this editor in PubMed   Google Scholar

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Table of contents (419 papers)

  1. Front Matter

    Pages I-XXXII
    Download chapter PDF

  3. Materials for Information Technology

    1. Si-based semiconductors

      1. Dark-field electron holography for the measurement of strain in nanostructures and devices
        • M. J. Hÿtch, F. Houdellier, F. Hüe, E. Snoeck
        Pages 5-6
      2. Some device challenges towards the 22nm CMOS technology
        • F. Andrieu, T. Ernst, O. Faynot, V. Delaye, D. Lafond, S. Deleonibus
        Pages 7-8
      3. Off-axis electron holography for the analysis of nm-scale semiconductor devices
        • D. Cooper, R. Truche, L. Clement, S. Pokrant, A. Chabli
        Pages 9-10
      4. Influence of the oxide thickness on the SiO2/Si interface structure
        • P. Donnadieu, V. Chamard, M. Maret, J. P. Simon, P. Mur
        Pages 11-12
      5. Challenges to TEM in high performance microprocessor manufacturing
        • H. J. Engelmann, H. Geisler, R. Huebner, P. Potapov, D. Utess, E. Zschech
        Pages 13-14
      6. Strain study in transistors with SiC and SiGe source and drain by STEM nano beam diffraction
        • P. Favia, D. Klenov, G. Eneman, P. Verheyen, M. Bauer, D. Weeks et al.
        Pages 15-16
      7. Cluster growth and luminescence in ion-implanted silica
        • H. -J. Fitting, Roushdey Salh, L. Kourkoutis, B. Schmidt
        Pages 17-18
      8. Coherence Measurements of Bulk and Surface Plasmons in Semiconductors by Diffracted Beam Holography
        • R. A. Herring
        Pages 19-20
      9. Comparison of 3D potential structures at different pn-junctions in FIB-prepared silicon and germanium samples measured by electron-holographic tomography
        • A. Lenk, D. Wolf, H. Lichte, U. Mühle
        Pages 21-22
      10. EELS analyses of metal-inserted high-<i>k</i> dielectric stacks
        • M. MacKenzie, A. J. Craven, D. W. McComb, C. M. McGilvery, S. McFadzean, S. De Gendt
        Pages 23-24
      11. Low voltage SEM observations of the dopant contrast in semiconductors
        • K. Masenelli-Varlot, S. Luca, G. Thollet, P. H. Jouneau, D. Mariolle
        Pages 25-26
      12. NiSi2/Si interface chemistry and epitaxial growth mode
        • S. B. Mi, C. L. Jia, K. Urban, Q. T. Zhao, S. Mantl
        Pages 27-28
      13. Detailed investigation of a tunnel oxide defect in a flash memory cell using TEM-tomography
        • U. Muehle, M. Krause, F. Goetze, D. Wolf, U. Gaebler
        Pages 29-30
      14. Overgrowth of the Mn4Si7 phase on/around the hexagonal SiC and cubic MnSi impurity phases in the Mn4Si7/Si films
        • A. Orekhov, T. Kamilov, E. I. Suvorova
        Pages 31-32
      15. HR-STEM EELS analysis of silicon 32 nm technology using a TITAN with a probe Cs corrector
        • R. Pantel, J. L Rouvière, E. Gautier, S. Denorme, C. Fenouiller-Beranger, F. Boeuf et al.
        Pages 33-34
      16. Tomographic analysis of a FinFET structure
        • O. Richard, P. Van Marcke, H. Bender
        Pages 35-36
      17. STEM EELS/EDX dopant analysis of nm-scale Si devices
        • G. Servanton, R. Pantel, M. Juhel, F. Bertin
        Pages 37-38
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Keywords

About this book

Proceedings of the14th European Microscopy Congress, held in Aachen, Germany, 1-5 September 2008. Jointly organised by the European Microscopy Society (EMS), the German Society for Electron Microscopy (DGE) and the local microscopists from RWTH Aachen University and the Research Centre Jülich, the congress brings together scientists from Europe and from all over the world. The scientific programme covers all recent developments in the three major areas of instrumentation and methods, materials science and life science.

Editors and Affiliations

  • Central Facility for Electron Microscopy, RWTH Aachen, Aachen, Germany

    Silvia Richter, Alexander Schwedt

Bibliographic Information

  • Book Title: EMC 2008

  • Book Subtitle: Vol 2: Materials Science

  • Editors: Silvia Richter, Alexander Schwedt

  • DOI: https://doi.org/10.1007/978-3-540-85226-1

  • Publisher: Springer Berlin, Heidelberg

  • eBook Packages: Physics and Astronomy, Physics and Astronomy (R0)

  • Copyright Information: Springer-Verlag Berlin Heidelberg 2008

  • Hardcover ISBN: 978-3-540-85225-4Published: 26 August 2008

  • Softcover ISBN: 978-3-662-50222-8Published: 23 August 2016

  • eBook ISBN: 978-3-540-85226-1Published: 20 September 2008

  • Edition Number: 1

  • Number of Pages: XXXVIII, 870

  • Topics: Physics, general

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