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Sputtering by Particle Bombardment III

Characteristics of Sputtered Particles, Technical Applications

  • Textbook
  • © 1991

Overview

Editors:
  1. Rainer Behrisch
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    You can also search for this editor in PubMed   Google Scholar

  2. Klaus Wittmaack
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    You can also search for this editor in PubMed   Google Scholar

Part of the book series: Topics in Applied Physics (TAP, volume 64)

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Table of contents (7 chapters)

  1. Front Matter

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  2. Introduction

    • Rainer Behrisch, Klaus Wittmaack
    Pages 1-13

  3. Angular, energy, and mass distribution of sputtered particles

    • Wolfgang O. Hofer
    Pages 15-90

  4. Charged and excited states of sputtered atoms

    • Ming L. Yu
    Pages 91-160

  5. Surface and depth analysis based on sputtering

    • Klaus Wittmaack
    Pages 161-256

  6. Desorption of organic molecules from solid and liquid surfaces induced by particle impact

    • Bo U. R. Sundqvist
    Pages 257-303

  7. Production of microstructures by ion beam sputtering

    • Wolfgang Haufe
    Pages 305-338

  8. Production of thin films by controlled deposition of sputtered material

    • Edwin D. McClanahan, Nils Laegreid
    Pages 339-377

  9. Back Matter

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Keywords

About this book

Sputtering, the ejection of atoms or groups of atoms from the surface of a solid bombarded by energetic particles, is a widely observed phenomenon that has many applications in today's experimental physics and technology. This is the third and final volume of a comprehensive review on sputtering. Whereas the first two volumes deal primarily with physical aspects such as the theory of sputtering, experimentally observed sputtering yields and surface topography changes, this volume is devoted to the characteristic properties of the sputtered particles and technological applications of sputtering. The particles are characterized by their energy, mass, and angular distributions, along with their charge and excitation states, while the applications described in- clude surface and depth analysis, micromachining, and the production of surface coatings and thin films. As in the previous two volumes, the various chapters have been written by the main authorities in the field. The book addresses a broad audience: scientists active in the field will find the overview and background information they have long been seeking, while students and new comers to surface science and materials science will find a readable introduction to sputtering.

Bibliographic Information

  • Book Title: Sputtering by Particle Bombardment III

  • Book Subtitle: Characteristics of Sputtered Particles, Technical Applications

  • Editors: Rainer Behrisch, Klaus Wittmaack

  • Series Title: Topics in Applied Physics

  • DOI: https://doi.org/10.1007/3-540-53428-8

  • Publisher: Springer Berlin, Heidelberg

  • eBook Packages: Springer Book Archive

  • Copyright Information: Springer-Verlag Berlin Heidelberg 1991

  • Softcover ISBN: 978-3-662-31104-2Published: 23 August 2014

  • eBook ISBN: 978-3-540-46881-3Published: 31 July 2005

  • Series ISSN: 0303-4216

  • Series E-ISSN: 1437-0859

  • Edition Number: 1

  • Number of Pages: XV, 415

  • Number of Illustrations: 66 b/w illustrations

  • Topics: Solid State Physics, Spectroscopy and Microscopy, Surfaces and Interfaces, Thin Films, Engineering, general

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