Editors:
- High-dielectric-constant materials have a huge potential for applications in microelectronic devices.
- This book provides the most comprehensive survey on their properties, processing and applications
- Includes supplementary material: sn.pub/extras
Part of the book series: Springer Series in Advanced Microelectronics (MICROELECTR., volume 16)
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Table of contents (21 chapters)
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Front Matter
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Transition to High-k Gate Dielectrics
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Future Directions for Ultimate Scaling Technology Generations
About this book
Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their impact, along with the creative directions and forthcoming challenges that will define the future of gate dielectric scaling technology. Topics include: an extensive review of Moore's Law, the classical regime for SiO2 gate dielectrics; the transition to silicon oxynitride gate dielectrics; the transition to high-K gate dielectrics (including the drive towards equivalent oxide thickness in the single-digit nanometer regime); and future directions and issues for ultimate technology generation scaling. The vision, wisdom, and experience of the team of authors will make this book a timely, relevant, and interesting, resource focusing on fundamentals of the 45 nm Technology Generation and beyond.
Editors and Affiliations
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International SEMATECH, Austin, USA
H.R. Huff
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Motorola, Austin, USA
D.C. Gilmer
Bibliographic Information
Book Title: High Dielectric Constant Materials
Book Subtitle: VLSI MOSFET Applications
Editors: H.R. Huff, D.C. Gilmer
Series Title: Springer Series in Advanced Microelectronics
DOI: https://doi.org/10.1007/b137574
Publisher: Springer Berlin, Heidelberg
eBook Packages: Chemistry and Materials Science, Chemistry and Material Science (R0)
Copyright Information: Springer-Verlag Berlin Heidelberg 2005
Hardcover ISBN: 978-3-540-21081-8Published: 30 September 2004
Softcover ISBN: 978-3-642-05921-6Published: 21 October 2010
eBook ISBN: 978-3-540-26462-0Published: 02 November 2005
Series ISSN: 1437-0387
Series E-ISSN: 2197-6643
Edition Number: 1
Number of Pages: XXIV, 710
Topics: Optical and Electronic Materials, Condensed Matter Physics, Surfaces and Interfaces, Thin Films, Engineering, general