Overview
- Nominated as an outstanding PhD thesis by the Complutense University of Madrid
- Demonstrates the possibility of depositing high permittivity materials (GdScO3) by means of high pressure sputtering from metallic targets using in situ plasma oxidation on Si and InP substrates
- Presents a concise review of the fabrication and characterization techniques of high permittivity dielectrics
- Also includes a study of the scavenging effect
- Includes supplementary material: sn.pub/extras
Part of the book series: Springer Theses (Springer Theses)
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Table of contents (9 chapters)
Keywords
About this book
This thesis describes the fabrication of metal-insulator-semiconductor (MIS) structures using very high permittivity dielectrics (based on rare earths) grown by high-pressure sputtering from metallic targets. It demonstrates the possibility of depositing high permittivity materials (GdScO3) by means of high pressure sputtering from metallic targets using in situ plasma oxidation on Si and indium phosphate (InP) substrates. The advantage of this system is the high working pressure, which causes the particles to undergo multiple collisions and become thermalized before reaching the substrate in a pure diffusion process, thus protecting the semiconductor surface from damage. This work presents a unique fabrication using metallic targets and involving a two-step deposition process: a thin metallic film is sputtered in an Ar atmosphere and this film is then plasma oxidized in situ. It also demonstrates the fabrication of GdScO3 on Si with a permittivity value above 30 from metallicGd and Sc targets. Since co-sputtering was not possible, a nanolaminate of these materials was deposited and annealed. The electrical properties of these devices show that the material is highly interesting from a microelectronic integration standpoint.
Authors and Affiliations
Bibliographic Information
Book Title: Growth of High Permittivity Dielectrics by High Pressure Sputtering from Metallic Targets
Authors: María Ángela Pampillón Arce
Series Title: Springer Theses
DOI: https://doi.org/10.1007/978-3-319-66607-5
Publisher: Springer Cham
eBook Packages: Physics and Astronomy, Physics and Astronomy (R0)
Copyright Information: Springer International Publishing AG 2017
Hardcover ISBN: 978-3-319-66606-8Published: 13 October 2017
Softcover ISBN: 978-3-319-88284-0Published: 18 May 2018
eBook ISBN: 978-3-319-66607-5Published: 04 October 2017
Series ISSN: 2190-5053
Series E-ISSN: 2190-5061
Edition Number: 1
Number of Pages: XXIII, 164
Number of Illustrations: 110 b/w illustrations, 6 illustrations in colour
Topics: Surface and Interface Science, Thin Films, Nanotechnology, Electronic Circuits and Devices, Nanotechnology and Microengineering