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Table of contents (7 chapters)
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Front Matter
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Back Matter
About this book
Authors and Affiliations
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Kramers Laboratorium voor Fysische Technologie, Delft University of Technology, Delft, The Netherlands
Chris R. Kleijn
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ZFE BT ACM 31, Siemens AG, München 83, Germany
Christoph Werner
Bibliographic Information
Book Title: Modeling of Chemical Vapor Deposition of Tungsten Films
Authors: Chris R. Kleijn, Christoph Werner
Series Title: Progress in Numerical Simulation for Microelectronics
DOI: https://doi.org/10.1007/978-3-0348-7741-1
Publisher: Birkhäuser Basel
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eBook Packages: Springer Book Archive
Copyright Information: Springer Basel AG 1993
Softcover ISBN: 978-3-0348-7743-5Published: 20 November 2013
eBook ISBN: 978-3-0348-7741-1Published: 11 November 2013
Edition Number: 1
Number of Pages: 139
Topics: Science, Humanities and Social Sciences, multidisciplinary