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Table of contents (7 chapters)
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Front Matter
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Back Matter
About this book
This text should serve as a useful reference source and handbook for scientists and engineers interested in depositing high quality parylene thin films.
Authors and Affiliations
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Department of Engineering Science, Rensselaer Polytechnic Institute, Troy, USA
Jeffrey B. Fortin
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GE Global Research Center, Niskayuna, USA
Jeffrey B. Fortin
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Department of Physics, Rensselaer Polytechnic Institute, Troy, USA
Toh-Ming Lu
Bibliographic Information
Book Title: Chemical Vapor Deposition Polymerization
Book Subtitle: The Growth and Properties of Parylene Thin Films
Authors: Jeffrey B. Fortin, Toh-Ming Lu
DOI: https://doi.org/10.1007/978-1-4757-3901-5
Publisher: Springer New York, NY
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eBook Packages: Springer Book Archive
Copyright Information: Springer-Verlag US 2004
Hardcover ISBN: 978-1-4020-7688-6Published: 30 November 2003
Softcover ISBN: 978-1-4419-5413-8Published: 03 December 2010
eBook ISBN: 978-1-4757-3901-5Published: 09 March 2013
Edition Number: 1
Number of Pages: XVII, 102
Topics: Surface and Interface Science, Thin Films, Industrial Chemistry/Chemical Engineering, Characterization and Evaluation of Materials