Physics, Fabrication, and Applications of Multilayered Structures

1. Front Matter

   Pages i-xiii

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2. Growth and Characterization of Multilayer Structure

   1. Front Matter

      Pages 1-1

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   2. Growth of Metallic and Metal-Containing Superlattices

      • Charles M. Falco

      Pages 3-15

   3. Multilayer Structures: Atomic Engineering in its Infancy

      • Troy W. Barbee Jr.

      Pages 17-32

   4. Molecular Beam Epitaxy of Artificially Layered Semiconductor Structures — Basic Concept and Recent Achievements

      • Klaus Ploog

      Pages 33-65

   5. The Structure of Multilayers: X-Ray Studies

      • D. B. McWhan

      Pages 67-92

   6. Rheed Oscillations in MBE and Their Applications to Precisely Controlled Crystal Growth

      • Tsunenori Sakamoto

      Pages 93-110

3. Physics of Multilayer Structure

   1. Front Matter

      Pages 111-111

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   2. Theoretical Background of Interfaces and Multilayers

      • J. P. Vigneron

      Pages 113-138

   3. The Physics of Metallic Superlattices: An Experimental Point of View

      • Ivan K. Schuller

      Pages 139-169

   4. Semiconductor Interfaces

      • R. H. Williams

      Pages 171-197

   5. Stability of Artificial Multilayers

      • Frans Spaepen

      Pages 199-214

   6. III-V Semiconductor Strained-Layer Superlattices

      • J.-Y. Marzin

      Pages 215-228

   7. Si/Ge Multilayered Structures

      • E. Kasper, H. J. Herzog, F. Schäffler

      Pages 229-238

4. Applications of Multilayer Structure

   1. Front Matter

      Pages 239-239

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   2. Electronic Devices Using Multilayer Structures

      • Serge Luryi

      Pages 241-270

   3. Multilayer Optics for X-Rays

      • Eberhard Spiller

      Pages 271-309

   4. Multilayer Neutron Optical Devices

      • F. Mezei

      Pages 311-333

5. Structural Studies and Fabrication

   1. Front Matter

      Pages 335-335

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   2. Xe Implanted Si Observed by Means of EXAFS

      • G. Faraci, A. R. Pennisi, A. Terrasi, S. Mobilio, A. Balerna

      Pages 337-337

Low-dimensional materials are of fundamental interest in physics and chemistry and have also found a wide variety of technological applica­ tions in fields ranging from microelectronics to optics. Since 1986, several seminars and summer schools devoted to low-dimensional systems have been supported by NATO. The present one, Physics, Fabrication and Applications of Multilayered structures, brought together specialists from different fields in order to review fabrication techniques, charac­ terization methods, physics and applications. Artificially layered materials are attractive because alternately layering two (or more) elements, by evaporation or sputtering, is a way to obtain new materials with (hopefully) new physical properties that pure materials or alloys do not allow. These new possibilities can be ob­ tained in electronic transport, optics, magnetism or the reflectivity of x-rays and slow neutrons. By changing the components and the thickness of the layers one can track continuously how the new properties appear and follow the importance of the multilayer structure of the materials. In addition, with their large number of interfaces the study of inter­ face properties becomes easier in multilayered structures than in mono­ layers or bilayers. As a rule, the role of the interface quality, and also the coupling between layers, increases as the thickness of the layer decreases. Several applications at the development stage require layer thicknesses of just a few atomic layers.

• X-ray
• chemistry
• crystal
• crystal structure
• development
• electron
• fields
• magnetism
• neutron
• optics
• scattering
• semiconductor
• structure
• superconductivity
• thin films

• Paris University, Orsay, France

  P. Dhez

• Thomson CSF, Orsay, France

  C. Weisbuch

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