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About this book
Polycrystalline silicon has played an important role in integrated-circuit technology for two decades. It was first used in self-aligned, silicon-gate, MOS ICs to reduce capacitance and improve circuit speed. In addition to this dominant use, polysilicon is now also included in virtually all modern bipolar ICs, where it improves the basic physics of device operation. The compatibility of polycrystalline silicon with subsequent high-temperature processing allows its efficient integration into advanced IC processes. This compatibility also permits polysilicon to be used early in the fabrication process for trench isolation and dynamic random-access-memory (DRAM) storage capacitors.
In addition to its integrated-circuit applications, polysilicon is becoming vital as the active layer in the channel of thin-film transistors in place of amorphous silicon. When polysilicon thin-film transistors are used in advanced active-matrix displays, the peripheral circuitry can be integrated into the same substrate as the pixel transistors. Recently, polysilicon has been used in the emerging field of microelectromechanical systems (MEMS), especially for microsensors and microactuators. In these devices, the mechanical properties, especially the stress in the polysilicon film, are critical to successful device fabrication.
Polycrystalline Silicon for Integrated Circuits and Displays, Second Edition is an invaluable reference for professionals and technicians workingwith polycrystalline silicon in the integrated circuit and display industries.
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Bibliographic Information
Book Title: Polycrystalline Silicon for Integrated Circuits and Displays
Authors: Ted Kamins
DOI: https://doi.org/10.1007/978-1-4615-5577-3
Publisher: Springer New York, NY
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eBook Packages: Springer Book Archive
Copyright Information: Springer Science+Business Media New York 1998
Hardcover ISBN: 978-0-7923-8224-9Published: 31 July 1998
Softcover ISBN: 978-1-4613-7551-7Published: 10 October 2012
eBook ISBN: 978-1-4615-5577-3Published: 06 December 2012
Edition Number: 2
Number of Pages: XV, 378
Topics: Circuits and Systems, Electrical Engineering, Optical and Electronic Materials, Characterization and Evaluation of Materials