Skip to main content
Book cover

Thin Film Device Applications

  • Book
  • © 1983

Overview

This is a preview of subscription content, log in via an institution to check access.

Access this book

eBook USD 39.99
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book USD 54.99
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Other ways to access

Licence this eBook for your library

Institutional subscriptions

Table of contents (8 chapters)

Keywords

About this book

Two-dimensional materials created ab initio by the process of condensation of atoms, molecules, or ions, called thin films, have unique properties significantly different from the corresponding bulk materials as a result of their physical dimensions, geometry, nonequilibrium microstructure, and metallurgy. Further, these characteristic features of thin films can be drasti­ cally modified and tailored to obtain the desired and required physical characteristics. These features form the basis of development of a host of extraordinary active and passive thin film device applications in the last two decades. On the one extreme, these applications are in the submicron dimensions in such areas as very large scale integration (VLSI), Josephson junction quantum interference devices, magnetic bubbles, and integrated optics. On the other extreme, large-area thin films are being used as selective coatings for solar thermal conversion, solar cells for photovoltaic conver­ sion, and protection and passivating layers. Indeed, one would be hard­ pressed to find many sophisticated modern optical and electronic devices which do not use thin films in one way or the other. With the impetus provided by industrial applications, the science and technology of thin films have undergone revolutionary development and even today continue to be recognized globally as frontier areas of RID work. Major technical developments in any field of science and technology are invariably accompanied by an explosion of published literature in the form of scientific publications, reviews, and books.

Editors and Affiliations

  • Indian Institute of Technology, New Delhi, India

    Kasturi Lal Chopra, Inderjeet Kaur

Bibliographic Information

  • Book Title: Thin Film Device Applications

  • Editors: Kasturi Lal Chopra, Inderjeet Kaur

  • DOI: https://doi.org/10.1007/978-1-4613-3682-2

  • Publisher: Springer New York, NY

  • eBook Packages: Springer Book Archive

  • Copyright Information: Plenum Press, New York 1983

  • Softcover ISBN: 978-1-4613-3684-6Published: 14 October 2011

  • eBook ISBN: 978-1-4613-3682-2Published: 06 December 2012

  • Edition Number: 1

  • Number of Pages: XII, 300

  • Topics: Surface and Interface Science, Thin Films, Electrical Engineering

Publish with us