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Table of contents (30 papers)
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Convergent Beam Electron Diffraction
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X-ray and Electron Energy Loss Microanalysis
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Cathodoluminescence and Electron Beam Induced Conductivity
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Further Analysis of Interfaces
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Ordering/decomposition/analysis of local strains
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Surface Microscopy and Diffraction
Keywords
About this book
Reviews
From Book News, Inc.
These proceedings comprise papers reviewing technical progress as well as applications in the areas of: electron microscopy; electron diffraction; energy loss microanalysis; cathodoluminescence; Schottky Barriers; interfaces; analysis of local strains; surface microscopy; and defects in heteroepitaxy.
Annotation copyright Book News, Inc. Portland, Or.
Editors and Affiliations
Bibliographic Information
Book Title: Evaluation of Advanced Semiconductor Materials by Electron Microscopy
Editors: David Cherns
Series Title: NATO Science Series B:
DOI: https://doi.org/10.1007/978-1-4613-0527-9
Publisher: Springer New York, NY
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eBook Packages: Springer Book Archive
Copyright Information: Plenum Press, New York 1989
Softcover ISBN: 978-1-4612-7850-4Published: 13 October 2011
eBook ISBN: 978-1-4613-0527-9Published: 06 December 2012
Series ISSN: 0258-1221
Edition Number: 1
Number of Pages: 412
Topics: Biomedicine general