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Particles on Surfaces 2

Detection, Adhesion, and Removal

  • Book
  • © 1989

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Editors:
  1. K. L. Mittal

    1. IBM U.S. Technical Education, Thornwood, USA

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Table of contents (25 chapters)

  1. Front Matter

    Pages i-viii
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  2. Particle-Substrate Interaction, Deposition and Adhesion

    1. Front Matter

      Pages 1-1
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    2. The Adhesion of Small Particles to a Surface

      • J. Reed
      Pages 3-17

    3. Application of Impact Adhesion Theory to Particle Kinetic Energy Loss Measurements

      • Stephen Wall, Walter John, Simon L. Goren
      Pages 19-34

    4. Adhesion Force Due To a Meniscus in a Crossed-Fiber System

      • Thomas M. Wentzel, William S. Bickel
      Pages 35-48

    5. Adhesion Induced Deformations between Particles and Substrates

      • L. P. DeMejo, D. S. Rimai, R. C. Bowen
      Pages 49-58

    6. The Effect of External Noises on the Attachment of Particles to Solid Surfaces

      • J. P. Hsu
      Pages 59-66

    7. Measurement of Detachable Submicrometer Particles and Surface Cleanliness of Clean Room Garments

      • Mark B. Stutman
      Pages 67-76

    8. Accumulation of Particle Derived Ionic Contaminants on Electronic Equipment: Airborne Concentrations and Deposition Velocities

      • J. D. Sinclair, L. A. Psota-Kelty, C. J. Weschler, H. C. Shields
      Pages 77-85

    9. Adhesion of Ash Particles on Heat Transfer Surfaces in Coal Combustion Applications: Mechanisms and Implications

      • R. Nagarajan
      Pages 87-97

    10. Factors Affecting Adhesion of Drug Particles to Surfaces in Pharmaceutical Systems

      • P. J. Stewart
      Pages 99-111

  3. Particle Detection, Analysis and Characterization

    1. Front Matter

      Pages 113-113
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    2. The Role of Infrared and Raman Microspectroscopies in the Characterization of Particles on Surfaces

      • Kenneth J. Ward, David R. Tallant
      Pages 115-142

    3. Infrared and Raman Microspectroscopy: An Overview of their Use in the Identification of Microscopic Particulates

      • Patricia L. Lang, Andre’ J. Sommer, J. E. Katon
      Pages 143-161

    4. Particle Identification By Auger Electron Spectroscopy

      • Kenneth D. Bomben, William F. Stickle
      Pages 163-169

    5. Identification and Characterization of Nonmetallic Particulate Contamination Removed from Aerospace Components

      • C. E. Wilson, D. A. Scheer
      Pages 171-180

    6. Surface Particle Inspection Plans in Semiconductor Manufacturing

      • Zinovy Fichtenholz, Leon L. Pesotchinsky
      Pages 181-188

    7. Particulate Generation and Detection on Surfaces

      • Marvin Fein
      Pages 189-194

    8. Identification of Small Particles on a Silicon Wafer

      • N. Fujino, S. Miyazaki, M. Takeshita, H. Horie, S. Sumita, T. Shiraiwa
      Pages 195-200

    9. The Evaluation of PWA and SMA Cleanliness Levels for “In-Line” Defluxing by High Performance Liquid Chromatography

      • R. F. Klima, J. K. Bonner
      Pages 201-213
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About this book

This volume documents the proceedings of the Second Symposium on Particles on Surfaces: Detection, Adhesion and Removal held as part of the 19th Annual Meeting of the Fine Particle Society in Santa Clara, California, July 20-25, 1988. The premier symposium on this topic was l organized in 1986 and has been properly chronicled . Based on the success of these two events and the high interest evinced by the technical community, we plan to regularly hold symposia on this topic on a biennial basis and the next one is slated for August 20-24, 1990 in San Diego, California. l As pointed out in the Preface to the first volume , the topic of particles on surfaces is of paramount importance in legion of technological areas. Particularly in the semiconductor device fabrication area, all signals indicate that the understanding of the behavior of particles on surfaces and their removal will attain heightened importance in the times to come. As the device dimensions are shrinking at an accelerated pace, so the benign particles of today will become the killer defects in the not too distant future. The tempo of research and development activity in the field of particles on surfaces is very high, and better and novel ways are continuously being devised to remove smaller and smaller particles.

Editors and Affiliations

  • IBM U.S. Technical Education, Thornwood, USA

    K. L. Mittal

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