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Plasma Processing of Semiconductors

  • Book
  • © 1997

Overview

Editors:
  1. P. F. Williams

    1. Department of Electrical Engineering, University of Nebraska-Lincoln, Lincoln, USA

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Part of the book series: NATO Science Series E: (NSSE, volume 336)

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Table of contents (28 chapters)

  1. Front Matter

    Pages i-x
    Download chapter PDF

  3. Plasma Deposition

    1. Introduction to Plasma Enhanced Chemical Vapor Deposition

      • T. S. Cale, G. B. Raupp, B. R. Rogers, F. R. Myers, T. E. Zirkle
      Pages 89-108

    2. Topography Evolution During Semiconductor Processing

      • T. S. Cale, V. Mahadev, Z. Tang, G. Rajagopalan, L. J. Borucki
      Pages 109-124

    3. Deposition of Amorphous Silicon

      • J. Perrin
      Pages 125-136

  4. Plasma Sources

    1. High Density Sources for Plasma Etching

      • T. D. Mantei
      Pages 137-156

    2. Resonant Plasma Excitation by Electron Cyclotron Waves - Fundamentals and Applications

      • H. Oechsner
      Pages 157-180

    3. The Transition from Capacitive to Inductive to Wave Sustained Discharges

      • R. W. Boswell, A. Ellingboe, A. Degeling, M. Lieberman, J. Derouard
      Pages 181-186

    4. Physics of Surface-Wave Discharges

      • J. Margot, M. Moisan
      Pages 187-210

  5. Plasma-Surface Interactions

    1. Surface Science Aspects of Etching and Wall Reactions in High Density Plasmas

      • J. W. Coburn
      Pages 211-219

    2. Plasma-Surface Interactions

      • Riccardo d’Agostino
      Pages 221-242

    3. Cl2 Plasma — Si Surface Interactions in Plasma Etching: X-ray Photoelectron Spectroscopy After Etching, and Optical and Mass Spectrometry Methods During Etching

      • V. M. Donnelly, N. Layadi, J. T. C. Lee, I. P. Herman, K. V. Guinn, C. C. Cheng
      Pages 243-275

  7. Plasma Diagnostics

    1. Optical Diagnostics of Processing Plasmas

      • P. F. Williams
      Pages 321-338

    2. Optical Diagnostics of Plasmas: A Tool for Process Control

      • Nader Sadeghi, Jacques Derouard, Jean-Paul Booth
      Pages 339-358

    3. Infrared Absorption Spectroscopy as a Diagnostic for Processing Plasmas

      • G. M. W. Kroesen
      Pages 359-374
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Keywords

About this book

Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications.
Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.

Editors and Affiliations

  • Department of Electrical Engineering, University of Nebraska-Lincoln, Lincoln, USA

    P. F. Williams

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