SpringerBriefs in Materials

Growth and Transport in Nanostructured Materials

Reactive Transport in PVD, CVD, and ALD

Authors: Yanguas-Gil, Angel

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eBook $54.99
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  • ISBN 978-3-319-24672-7
  • Digitally watermarked, DRM-free
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  • Immediate eBook download after purchase
Softcover $69.99
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  • ISBN 978-3-319-24670-3
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  • Usually dispatched within 3 to 5 business days.
About this book

This book will address the application of gas phase thin film methods, including techniques such as evaporation, sputtering, CVD, and ALD to the synthesis of materials on nanostructured and high aspect-ratio high surface area materials. We have chosen to introduce these topics and the different application fields from a chronological perspective: we start with the early concepts of step coverage and later conformality in semiconductor manufacturing, and how later on the range of application branched out to include others such as energy storage, catalysis, and more broadly nanomaterials synthesis.
 
The book will describe the ballistic and continuum descriptions of gas transport on nanostructured materials and then will move on to incorporate the impact of precursor-surface interaction. We will finally conclude approaching the subjects of feature shape evolution and the connection between nano and reactor scales and will briefly present different advanced algorithms that can be used to effectively compute particle transport, in some cases borrowing from other disciplines such as radiative heat transfer. The book gathers in a single place information scattered over thirty years of scientific research, including the most recent results in the field of Atomic Layer Deposition. Besides a mathematical description of the fundamentals of thin film growth in nanostructured materials, it includes analytic expressions and plots that can be used to predict the growth using gas phase synthesis methods in a number of ideal approximations. The focus on the fundamental aspects over particular processes will broaden the appeal and the shelf lifetime of this book. The reader of this book will gain a thorough understanding on the coating of high surface area and nanostructured materials using gas phase thin film deposition methods, including the limitations of each technique. Those coming from the theoretical side will gain the knowledge required to model the growth process, while those readers more interested in the process development will gain the theoretical understanding will be useful for process optimization.

Table of contents (5 chapters)

  • Introduction

    Yanguas-Gil, Angel

    Pages 1-18

  • Physical and Chemical Vapor Deposition¬†Techniques

    Yanguas-Gil, Angel

    Pages 19-37

  • Fundamentals of Gas Phase Transport in Nanostructured Materials

    Yanguas-Gil, Angel

    Pages 39-67

  • Thin Film Growth in Nanostructured Materials

    Yanguas-Gil, Angel

    Pages 69-99

  • Advanced Concepts

    Yanguas-Gil, Angel

    Pages 101-125

Buy this book

eBook $54.99
price for USA (gross)
  • ISBN 978-3-319-24672-7
  • Digitally watermarked, DRM-free
  • Included format: PDF, EPUB
  • ebooks can be used on all reading devices
  • Immediate eBook download after purchase
Softcover $69.99
price for USA
  • ISBN 978-3-319-24670-3
  • Free shipping for individuals worldwide
  • Usually dispatched within 3 to 5 business days.
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Bibliographic Information

Bibliographic Information
Book Title
Growth and Transport in Nanostructured Materials
Book Subtitle
Reactive Transport in PVD, CVD, and ALD
Authors
Series Title
SpringerBriefs in Materials
Copyright
2017
Publisher
Springer International Publishing
Copyright Holder
The Author(s)
eBook ISBN
978-3-319-24672-7
DOI
10.1007/978-3-319-24672-7
Softcover ISBN
978-3-319-24670-3
Series ISSN
2192-1091
Edition Number
1
Number of Pages
XI, 128
Number of Illustrations and Tables
37 b/w illustrations, 20 illustrations in colour
Topics