Skip to main content
  • Book
  • © 2014

Copper Electrodeposition for Nanofabrication of Electronics Devices

  • Focuses on wide range of microelectronics application
  • Describes scientific mechanism of copper electrodeposition
  • Modern and basic knowledge about nanotechnology
  • Includes supplementary material: sn.pub/extras

Part of the book series: Nanostructure Science and Technology (NST, volume 171)

Buy it now

Buying options

eBook USD 69.99
Price excludes VAT (USA)
  • Available as EPUB and PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book USD 89.99
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info
Hardcover Book USD 109.99
Price excludes VAT (USA)
  • Durable hardcover edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Other ways to access

This is a preview of subscription content, log in via an institution to check for access.

Table of contents (12 chapters)

  1. Front Matter

    Pages i-viii
  2. Copper Electrodepositon and Additive Chemistry

    1. Front Matter

      Pages 1-1
    2. Copper Electrodepositon

      • Masayuki Yokoi
      Pages 3-25
    3. Supression Effect and Additive Chemistry

      • Masayuki Yokoi
      Pages 27-43
    4. Acceleration Effect

      • Dale P. Barkey
      Pages 45-61
    5. Modeling and Simulation

      • Yutaka Kaneko
      Pages 63-95
  3. Copper on Chip Metallization

    1. Front Matter

      Pages 97-97
    2. Microstructure Evolution of Copper in Nanoscale Interconnect Features

      • James Kelly, Christopher Parks, James Demarest, Juntao Li, Christopher Penny
      Pages 115-130
    3. Direct Copper Plating

      • Aleksandar Radisic, Philippe M. Vereecken
      Pages 131-173
  4. Through Silicon Via and Other Methods

    1. Front Matter

      Pages 171-171
    2. Through Silicon Via

      • Kazuo Kondo
      Pages 177-192
    3. Build-up Printed Wiring Boards (Build-up PWBs)

      • Kiyoshi Takagi, Toshikazu Okubo
      Pages 193-227
    4. Copper Foil Smooth on Both Sides for Lithium-Ion Battery

      • Akitoshi Suzuki, Jun Shinozaki
      Pages 229-265
    5. Through Hole Plating

      • Wei-Ping Dow
      Pages 267-282
  5. Erratum to: Acceleration Effect

    • Dale P. Barkey
    Pages E1-E1

About this book

This book discusses the scientific mechanism of copper electrodeposition and it's wide range of applications. The book will cover everything from the basic fundamentals to practical applications. In addition, the book will also cover important topics such as: • ULSI wiring material based upon copper nanowiring • Printed circuit boards • Stacked semiconductors • Through Silicon Via • Smooth copper foil for Lithium-Ion battery electrodes. This book is ideal for nanotechnologists, industry professionals, and practitioners.

Editors and Affiliations

  • Dept. of Chemical Engineering, Osaka Prefecture University, Osaka, Japan

    Kazuo Kondo

  • Intel Corporation, Hillsboro, USA

    Rohan N. Akolkar

  • Dept. of Chemical Engineering, University of New Hampshire, Durham, USA

    Dale P. Barkey

  • Industrial Technology Support Institute, Osaka Prefecture, Japan

    Masayuki Yokoi

About the editors

Kazuo Kondo is Professor at the Department of Chemical engineering, Osaka Prefecture University. He has over 200 research publications and 100 patents. His major areas of research are copper electrodeposition for nano fabrication, electrodeposition, batteries, and CVD.

Dale Barkey is a Professor of Chemical Engineering at the University of New Hampshire where he joined the faculty in 1987. His research in Electrochemical Engineering has addressed Pattern Formation, Electrodeposition, Anodizing and Corrosion Processes. His work has appeared in The Journal of the Electrochemical Society, Physical Review, The American Concrete Institute Materials Journal and Plating and Surface Finishing.

Rohan Akolkar is an Associate Professor of Chemical Engineering at Case Western Reserve University (CWRU) in Cleveland, OH. His research focuses on fundamental electrochemistry and electrochemical engineering. His work on electrodeposition has appeared in the Journal of the Electrochemical Society and the Journal of Power Sources. In 2004, he was received the Norman Hackerman Prize by the Electrochemical Society.

Masayuki Yokoi is the Chief Technical Consultant at the Industrial Technology Support Institute of Higashioska City, Osaka Prefecture, Japan.

Bibliographic Information

Buy it now

Buying options

eBook USD 69.99
Price excludes VAT (USA)
  • Available as EPUB and PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book USD 89.99
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info
Hardcover Book USD 109.99
Price excludes VAT (USA)
  • Durable hardcover edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Other ways to access