SpringerBriefs in Materials

Helium Ion Microscopy

Principles and Applications

Authors: Joy, David C.

  • Serves as a concise but authoritative introduction to the latest innovation in scanning microscopy
  • Compares ion and electron beams as options for microscopy
  • Presents a detailed physical model of ion-solid interactions and signal generation
  • Provides a detailed database of iSE yield behavior as a function of the target ion, element, and energy
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eBook $39.99
price for USA (gross)
  • ISBN 978-1-4614-8660-2
  • Digitally watermarked, DRM-free
  • Included format: EPUB, PDF
  • ebooks can be used on all reading devices
  • Immediate eBook download after purchase
Softcover $54.99
price for USA
  • ISBN 978-1-4614-8659-6
  • Free shipping for individuals worldwide
  • Usually dispatched within 3 to 5 business days.
About this book

Helium Ion Microscopy: Principles and Applications describes the theory and discusses the practical details of why scanning microscopes using beams of light ions – such as the Helium Ion Microscope (HIM) – are destined to become the imaging tools of choice for the 21st century. Topics covered include the principles, operation, and performance of the Gaseous Field Ion Source (GFIS), and a comparison of the optics of ion and electron beam microscopes including their operating conditions, resolution, and signal-to-noise performance. The physical principles of Ion-Induced Secondary Electron (iSE) generation by ions are discussed, and an extensive database of iSE yields for many elements and compounds as a function of incident ion species and its energy is included. Beam damage and charging are frequently outcomes of ion beam irradiation, and techniques to minimize such problems are presented. In addition to imaging, ions beams can be used for the controlled deposition, or removal, of selected materials with nanometer precision. The techniques and conditions required for nanofabrication are discussed and demonstrated. Finally, the problem of performing chemical microanalysis with ion beams is considered. Low energy ions cannot generate X-ray emissions, so alternative techniques such as Rutherford Backscatter Imaging (RBI) or Secondary Ion Mass Spectrometry (SIMS) are examined.

Reviews

From the reviews:

“Helium Ion Microscopy, Principles and Applications, is a compact volume of 64 pages, and is useful to anyone wishing fundamental knowledge on this topic. … There are many features of this book that make it a useful resource for both the beginning and advanced microscopist. … this book provides a novice researcher an initial resource to determine if this methodology is useful to their particular area and to determine what trade-offs are necessary.” (Michael T. Postek, Microscopy and Microanalysis, Vol. 20 (2), 2014)

Table of contents (9 chapters)

Buy this book

eBook $39.99
price for USA (gross)
  • ISBN 978-1-4614-8660-2
  • Digitally watermarked, DRM-free
  • Included format: EPUB, PDF
  • ebooks can be used on all reading devices
  • Immediate eBook download after purchase
Softcover $54.99
price for USA
  • ISBN 978-1-4614-8659-6
  • Free shipping for individuals worldwide
  • Usually dispatched within 3 to 5 business days.
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Bibliographic Information

Bibliographic Information
Book Title
Helium Ion Microscopy
Book Subtitle
Principles and Applications
Authors
Series Title
SpringerBriefs in Materials
Copyright
2013
Publisher
Springer-Verlag New York
Copyright Holder
David C. Joy
eBook ISBN
978-1-4614-8660-2
DOI
10.1007/978-1-4614-8660-2
Softcover ISBN
978-1-4614-8659-6
Series ISSN
2192-1091
Edition Number
1
Number of Pages
VIII, 64
Number of Illustrations and Tables
13 b/w illustrations, 16 illustrations in colour
Topics