The Springer International Series in Engineering and Computer Science

Ion Implantation: Basics to Device Fabrication

Authors: Rimini, Emanuele

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About this book

Ion implantation offers one of the best examples of a topic that starting from the basic research level has reached the high technology level within the framework of microelectronics. As the major or the unique procedure to selectively dope semiconductor materials for device fabrication, ion implantation takes advantage of the tremendous development of microelectronics and it evolves in a multidisciplinary frame. Physicists, chemists, materials sci­ entists, processing, device production, device design and ion beam engineers are all involved in this subject. The present monography deals with several aspects of ion implantation. The first chapter covers basic information on the physics of devices together with a brief description of the main trends in the field. The second chapter is devoted to ion im­ planters, including also high energy apparatus and a description of wafer charging and contaminants. Yield is a quite relevant is­ sue in the industrial surrounding and must be also discussed in the academic ambient. The slowing down of ions is treated in the third chapter both analytically and by numerical simulation meth­ ods. Channeling implants are described in some details in view of their relevance at the zero degree implants and of the available industrial parallel beam systems. Damage and its annealing are the key processes in ion implantation. Chapter four and five are dedicated to this extremely important subject.

Table of contents (8 chapters)

Buy this book

eBook $219.00
price for USA (gross)
  • ISBN 978-1-4615-2259-1
  • Digitally watermarked, DRM-free
  • Included format: PDF
  • ebooks can be used on all reading devices
  • Immediate eBook download after purchase
Hardcover $284.00
price for USA
  • ISBN 978-0-7923-9520-1
  • Free shipping for individuals worldwide
  • Usually dispatched within 3 to 5 business days.
Softcover $284.00
price for USA
  • ISBN 978-1-4613-5952-4
  • Free shipping for individuals worldwide
  • Usually dispatched within 3 to 5 business days.
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Bibliographic Information

Bibliographic Information
Book Title
Ion Implantation: Basics to Device Fabrication
Authors
Series Title
The Springer International Series in Engineering and Computer Science
Series Volume
293
Copyright
1995
Publisher
Springer US
Copyright Holder
Springer Science+Business Media New York
eBook ISBN
978-1-4615-2259-1
DOI
10.1007/978-1-4615-2259-1
Hardcover ISBN
978-0-7923-9520-1
Softcover ISBN
978-1-4613-5952-4
Series ISSN
0893-3405
Edition Number
1
Number of Pages
XIII, 393
Topics